DocumentCode :
1184328
Title :
Lifting Field of Free Conducting Particles in Compressed SF6 with Dielectric Coated Electrodes
Author :
Parekh, H. ; Srivastava, K.D. ; van Heeswijk, R.G.
Author_Institution :
Department of Electrical Engineering University of Waterloo
Issue :
3
fYear :
1979
fDate :
5/1/1979 12:00:00 AM
Firstpage :
748
Lastpage :
758
Abstract :
The lifting field of a free conducting particle (FCP) situated on a dielectric coated electrode in compressed SF6 gas is calculated based on two different particle charging mechanisms-partial discharges occurring in the gas surrounding the particle and charge conduction through the dielectric coating. Calculated values are compared with experimental results obtained for different thicknesses of anodized (Al203) coatings and at different gas pressures. It is suggested that at lower pressures a partial discharge mechanism is predominant whereas at higher pressures a charge conduction mechanism is predominant.
Keywords :
Coatings; Contamination; Corona; Dielectrics; Electrodes; Electrostatics; Gas insulation; Partial discharges; Sulfur hexafluoride; Voltage;
fLanguage :
English
Journal_Title :
Power Apparatus and Systems, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9510
Type :
jour
DOI :
10.1109/TPAS.1979.319287
Filename :
4113543
Link To Document :
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