Title :
Semiconductor-film grafting-a new approach to OEICs
Author :
Yi-Yan, Alfredo ; Chan, Winston K.
Author_Institution :
Bellcore, Red Bank, NJ, USA
fDate :
5/1/1992 12:00:00 AM
Abstract :
The use of semiconductor-film grafting for the hybrid integration of optoelectronic devices and its advantages in post-transfer fabrication are described. It is shown that grafted films are optically coupled to the substrate, making it possible to mix the semiconductor properties with some properties in the substrate, not commonly found in semiconductors, to yield new devices with no counterpart in other technologies. The semiconductor-film grafting, device fabrication, optical interaction between the semiconductor film and host substrate, and the integration of lasers with glass and LiNbO/sub 3/ waveguides are discussed.<>
Keywords :
integrated optoelectronics; lithium compounds; optical waveguides; LiNbO/sub 3/ waveguides; OEIC fabrication; device fabrication; glass waveguides; grafted films; hybrid integration; integration of lasers; optical interaction; optoelectronic devices; post-transfer fabrication; semiconductor-film grafting; Integrated optics; Optical coupling; Optical device fabrication; Optical devices; Optical films; Optical waveguides; Optoelectronic devices; Semiconductor films; Semiconductor lasers; Substrates;
Journal_Title :
Circuits and Devices Magazine, IEEE
