DocumentCode :
1185227
Title :
Reduction of the off-state current of polysilicon thin-film transistors by means of a polysilicon buffer layer
Author :
Hamada, Hiroyuki ; Hirano, Keizo ; Goda, N. ; Abe, H. ; Hasegawa, Isao ; Okita, Yuji ; Niina, T.
Author_Institution :
Sanyo Electr. Co. Ltd., Kobe
Volume :
30
Issue :
20
fYear :
1994
fDate :
9/29/1994 12:00:00 AM
Firstpage :
1719
Lastpage :
1720
Abstract :
The off state current for polysilicon thin-film transistors for pixels in LCDs has been successfully reduced by introducing a polysilicon buffer layer between a polysilicon active layer fabricated by solid-phase-crystallisation (SPC) and a fused quartz substrate. Off-slate current of less than 1 pA under Vgs=-25 V at Vds=3 V was obtained for n-channel single-gate coplanar transistors using the buffer layer (400 Å)
Keywords :
elemental semiconductors; silicon; thin film transistors; LCDs; Si; fused quartz substrate; n-channel single-gate coplanar transistors; off-state current; polysilicon buffer layer; polysilicon thin-film transistors; solid-phase-crystallisation;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19941131
Filename :
328453
Link To Document :
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