DocumentCode :
1186175
Title :
Flash EEPROM threshold instabilities due to charge trapping during program/erase cycling
Author :
Mielke, Neal ; Belgal, Hanmant ; Kalastirsky, Ivan ; Kalavade, Pranav ; Kurtz, Andrew ; Meng, Qingru ; Righos, Nick ; Wu, Jie
Author_Institution :
Intel Corp., Santa Clara, CA, USA
Volume :
4
Issue :
3
fYear :
2004
Firstpage :
335
Lastpage :
344
Abstract :
Charge trapping over the channel can occur from program/erase cycling of Flash memory cells, increasing the cell threshold voltage and causing threshold shifts in retention tests when charges detrap. The empirical characteristics of these effects are discussed. Trapping has a square-root dependence on program/erase cycle count. Detrapping scales with the logarithm of time and is thermally accelerated with an activation energy of 1.1 to 1.2 eV. Detrapping has only a weak dependence on electric field. These mechanisms are intrinsic, yet there is a wide variation in behavior from one cell to another related to Poisson statistical variations. Common reliability characterization methods need to be re-thought in light of the characteristics of this and other mechanisms. In particular, performing extensive program/erase cycling with no delays between cycles is unrealistic for this mechanism, and alternative distributed-cycling schemes are proposed.
Keywords :
Poisson distribution; electron traps; flash memories; reliability; 1.1 to 1.2 eV; cell threshold voltage; charge carrier processes; charge detrapping; charge trapping; distributed-cycling schemes; flash EEPROM threshold instabilities; flash memory cells; program-erase cycling; threshold shifts; Acceleration; Channel hot electron injection; Delay; EPROM; Flash memory; Flash memory cells; Interface states; Testing; Threshold voltage; Tunneling;
fLanguage :
English
Journal_Title :
Device and Materials Reliability, IEEE Transactions on
Publisher :
ieee
ISSN :
1530-4388
Type :
jour
DOI :
10.1109/TDMR.2004.836721
Filename :
1369194
Link To Document :
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