• DocumentCode
    1186241
  • Title

    The two-bit NROM reliability

  • Author

    Shappir, Assaf ; Lusky, Eli ; Cohen, Guy ; Bloom, Ilan ; Janai, Meir ; Eitan, Boaz

  • Author_Institution
    Saifun Semicond. Ltd., Netanya, Israel
  • Volume
    4
  • Issue
    3
  • fYear
    2004
  • Firstpage
    397
  • Lastpage
    403
  • Abstract
    Saifun NROM™ is a novel localized charge-trapping-based nonvolatile memory technology that employs inherent two-bits-per-cell operation. NROM technology is able to provide code flash, data flash, embedded flash, and true EEPROM functionality with a single fabrication process and minor architectural adjustments. Reliability topics of NROM technology are discussed, focusing on the ability to achieve 10-year data retention after 105 program and erase cycles. The accumulated knowledge of NROM physics allows this technology to successfully compete with the industry standard floating-gate memory technology and to gain the acceptance of the memory market.
  • Keywords
    flash memories; integrated circuit reliability; read-only storage; ONO; Saifun NROM; data retention; erase cycles; floating-gate memory technology; memory market; nitride; nonvolatile memory; program cycles; two-bit NROM reliability; two-bits-per-cell; Charge carrier processes; Costs; EPROM; Electron traps; Fabrication; Helium; Nonvolatile memory; Paper technology; Physics; Threshold voltage;
  • fLanguage
    English
  • Journal_Title
    Device and Materials Reliability, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1530-4388
  • Type

    jour

  • DOI
    10.1109/TDMR.2004.836717
  • Filename
    1369201