• DocumentCode
    1186467
  • Title

    12 GHz F_{\\rm MAX} GaN/AlN/AlGaN Nanowire MISFET

  • Author

    Vandenbrouck, Simon ; Madjour, Kamel ; Theron, Didier ; Dong, Yajie ; Li, Yat ; Lieber, Charles M. ; Gaquiere, Christophe

  • Author_Institution
    Centre Nat. de la Rech. Sci., Inst. of Electron. Microelectron. & Nanotechnol., Villeneuve-d´´Ascq
  • Volume
    30
  • Issue
    4
  • fYear
    2009
  • fDate
    4/1/2009 12:00:00 AM
  • Firstpage
    322
  • Lastpage
    324
  • Abstract
    GaN/AlN/AlGaN/GaN nanowire metal-insulator-semiconductor field-effect transistors (MISFETs) have been fabricated for the first time with submicrometer gate lengths. Their microwave performances were investigated. An intrinsic current-gain cutoff frequency (F T) of 5 GHz as well as an intrinsic maximum available gain (F MAX) cutoff frequency of 12 GHz have been obtained for the first time and associated with a gate length of 0.5 mum. These results show the great potentiality of GaN-based nanowire FETs for microwave applications.
  • Keywords
    III-V semiconductors; MISFET; aluminium compounds; gallium compounds; nanowires; wide band gap semiconductors; GaN-AlN-AlGaN; intrinsic maximum available gain; metal-insulator-semiconductor field-effect transistors; microwave applications; nanowire MISFET; submicrometer gate lengths; Heterojunction; metal–insulator–semiconductor FET (MISFET); microwave field-effect transistors (FETs); quantum wires; semiconductor devices;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2009.2014791
  • Filename
    4798194