• DocumentCode
    11867
  • Title

    Impact of Local Interconnects on Timing and Power in a High Performance Microprocessor

  • Author

    Shelar, R.S. ; Patyra, M.

  • Author_Institution
    Intel Corp., Austin, TX, USA
  • Volume
    32
  • Issue
    10
  • fYear
    2013
  • fDate
    Oct. 2013
  • Firstpage
    1623
  • Lastpage
    1627
  • Abstract
    In nanometer technologies, local interconnects are believed to cause a major impact on timing and power in VLSI circuits. To assess the impact of the interconnects on timing and power in a real high performance microprocessor design in a quantitative manner, this article presents results from an extensive study carried out on RTL-to-layout synthesized blocks in a 45-nm technology core. The study shows that the interconnects in these blocks account for 30% of the cycle time, on an average, on the worst internal timing paths and contribute nearly one-third to the power dissipation. This points to severity of impact due to the interconnects in today´s high performance designs.
  • Keywords
    VLSI; integrated circuit interconnections; integrated circuit layout; microprocessor chips; nanotechnology; RTL-to-layout; VLSI circuits; high performance microprocessor; local interconnects; nanometer technologies; nanotechnology core; power dissipation; size 45 nm; synthesized blocks; worst internal timing paths; Clocks; Delays; Integrated circuit interconnections; Microprocessors; Repeaters; Wires; Interconnects; microprocessors; power; timing;
  • fLanguage
    English
  • Journal_Title
    Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0278-0070
  • Type

    jour

  • DOI
    10.1109/TCAD.2013.2266404
  • Filename
    6601022