DocumentCode
11867
Title
Impact of Local Interconnects on Timing and Power in a High Performance Microprocessor
Author
Shelar, R.S. ; Patyra, M.
Author_Institution
Intel Corp., Austin, TX, USA
Volume
32
Issue
10
fYear
2013
fDate
Oct. 2013
Firstpage
1623
Lastpage
1627
Abstract
In nanometer technologies, local interconnects are believed to cause a major impact on timing and power in VLSI circuits. To assess the impact of the interconnects on timing and power in a real high performance microprocessor design in a quantitative manner, this article presents results from an extensive study carried out on RTL-to-layout synthesized blocks in a 45-nm technology core. The study shows that the interconnects in these blocks account for 30% of the cycle time, on an average, on the worst internal timing paths and contribute nearly one-third to the power dissipation. This points to severity of impact due to the interconnects in today´s high performance designs.
Keywords
VLSI; integrated circuit interconnections; integrated circuit layout; microprocessor chips; nanotechnology; RTL-to-layout; VLSI circuits; high performance microprocessor; local interconnects; nanometer technologies; nanotechnology core; power dissipation; size 45 nm; synthesized blocks; worst internal timing paths; Clocks; Delays; Integrated circuit interconnections; Microprocessors; Repeaters; Wires; Interconnects; microprocessors; power; timing;
fLanguage
English
Journal_Title
Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on
Publisher
ieee
ISSN
0278-0070
Type
jour
DOI
10.1109/TCAD.2013.2266404
Filename
6601022
Link To Document