DocumentCode :
118744
Title :
Effect of waveguide thickness layer on spectral resonance of a Guided Mode Resonance Filter
Author :
Saleem, Muhammad Rizwan ; Ali, Raian ; Honkanen, S. ; Turunen, Jari
Author_Institution :
Inst. of Photonics, Univ. of Eastern Finland, Joensuu, Finland
fYear :
2014
fDate :
14-18 Jan. 2014
Firstpage :
39
Lastpage :
43
Abstract :
We demonstrated cost-effective Guided Mode Resonance Filters (GMRFs) that are diffraction gratings with spectrally narrow reflectance peaks due to resonance anomalies and couple incident light into a semi-guided mode in a corrugated waveguide. The GMRF consists of a single high index dielectric layer on a periodically corrugated transparent substrate to couple light. The GMRFs are designed by Fourier Modal Method (FMM), a numerical tool based on rigorous calculations of electromagnetic diffraction theory. In FMM the field is expanded in different regimes with the application of boundary conditions at each interface. GMRFs in polymer materials (polycarbonate) are fabricated by Nano-Imprint Lithography (NIL) from a master silicon-stamp. The master Si-stamp is fabricated by the exposure of Electron Beam Lithography (EBL) on a negative & binary tone resist, Hydrogen silsesquioxane (HSQ) to make sub-wavelength grating structures. The fabricated gratings are coated by a high refractive index TiO2 amorphous thin layer using Atomic Layer Deposition (ALD). GMRFs are demonstrated both theoretically and experimentally to shift spectral resonance towards longer wavelengths with the increase in TiO2 thickness.
Keywords :
amorphous state; atomic layer deposition; diffraction gratings; electromagnetic wave diffraction; electron beam lithography; optical waveguide filters; polymers; refractive index; resonator filters; silicon; soft lithography; titanium compounds; Fourier modal method; Si; TiO2; atomic layer deposition; boundary conditions; corrugated waveguide; diffraction gratings; electromagnetic diffraction theory; electron beam lithography; guided mode resonance filter; high refractive index TiO2 amorphous thin layer; hydrogen silsesquioxane; master silicon-stamp; nanoimprint lithography; negative binary tone resist; periodically corrugated transparent substrate; polycarbonate; polymer materials; reflectance; single high index dielectric layer; spectral resonance; waveguide thickness layer effect; Films; Filtering theory; Gratings; Optical filters; Optical waveguides; Reflectivity;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Applied Sciences and Technology (IBCAST), 2014 11th International Bhurban Conference on
Conference_Location :
Islamabad
Type :
conf
DOI :
10.1109/IBCAST.2014.6778117
Filename :
6778117
Link To Document :
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