Ultralow loss ring resonators using 3.5% index-contrast Ge-doped silica waveguides

Author

Bourdon, G. ; Alibert, G. ; Beguin, A. ; Bellman, B. ; Guiot, E.

Author_Institution

Corning S.A., Avon, France

Volume

15

Issue

5

fYear

2003

fDate

5/1/2003 12:00:00 AM

Firstpage

709

Lastpage

711

Abstract

Ring resonators (RRs) with a round-trip loss below 0.1 dB and a maximum free-spectral range (FSR) of 62.7 GHz were successfully fabricated. Single-mode waveguides of essentially square cross sections (/spl sim/2.6 × 2.8 μm²) were patterned through reactive ion etching on a core layer of high Ge content doped silica deposited using plasma-enhanced chemical vapor deposition; they received a silica overclad. A propagation loss of 0.085 dB/cm was recorded for these waveguides. We strongly believe that our technology makes it possible to fabricate equally ultralow-loss RRs of even smaller bending radius, reaching an FSR of 100 GHz, thus opening the way to the design of filters for wavelength-division-multiplexing systems.

Keywords

bending; germanium; optical fabrication; optical losses; optical resonators; optical waveguide filters; optical waveguides; plasma CVD; resonator filters; silicon compounds; sputter etching; 0.1 dB; SiO/sub 2/:Ge; bending radius; filter design; high Ge content core layer; index-contrast SiO/sub 2/:Ge waveguides; maximum free-spectral range; optical strip waveguides; plasma-enhanced chemical vapor deposition; propagation loss; reactive ion etching; resonator filters; round-trip loss; silica overclad; single-mode waveguides; square cross sections; ultralow loss ring resonators; waveguide bends; wavelength-division-multiplexing systems; Chemical technology; Chemical vapor deposition; Etching; Filters; Optical ring resonators; Plasma applications; Plasma chemistry; Plasma waves; Propagation losses; Silicon compounds;

fLanguage

English

Journal_Title

Photonics Technology Letters, IEEE

Publisher

ieee

ISSN

1041-1135

Type

jour

DOI

10.1109/LPT.2003.809925

Filename

1196144