Title :
Polymeric long-period waveguide gratings
Author :
Tsoi, H.C. ; Wong, W.H. ; Pun, E.Y.B.
Author_Institution :
Dept. of Electron. Eng., City Univ. of Hong Kong, Kowloon, China
fDate :
5/1/2003 12:00:00 AM
Abstract :
A long-period waveguide grating (LPWG) was demonstrated in a polymeric waveguide fabricated on an SiO/sub 2/-Si substrate using standard cleanroom fabrication processes: ultraviolet photolithography and reactive ion etching. Experimental results confirm that the relationship between the transmission peak wavelength and the grating period is linear. The LPWG exhibits a maximum attenuation of -18 dB, a minimum 3-dB bandwidth of 6 nm, and the grating length can be as short as 1 cm. The temperature characteristic d/spl lambda//dT of the LPWG was also investigated, and is found to be similar to that of long-period fiber gratings.
Keywords :
diffraction gratings; integrated optics; optical fabrication; optical phase matching; optical polymers; optical waveguide components; sputter etching; ultraviolet lithography; 1 cm; Si; SiO/sub 2/-Si; SiO/sub 2/-Si substrate; cleanroom fabrication processes; grating length; grating period; maximum attenuation; minimum 3-dB bandwidth; phase matching condition; polymeric long-period waveguide gratings; reactive ion etching; temperature characteristic; transmission peak wavelength; ultraviolet photolithography; Etching; Fiber gratings; Lithography; Optical attenuators; Optical device fabrication; Optical filters; Optical polymers; Optical refraction; Optical sensors; Optical waveguides;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2003.810257
