DocumentCode
1188430
Title
Short-Wavelength (760–920 nm) AlGaInAs Quantum Dot Lasers
Author
Schlereth, Thomas W. ; Schneider, Christian ; Gerhard, Sven ; Höfling, Sven ; Forchel, Alfred
Author_Institution
Tech. Phys., Univ. Wurzburg, Wurzburg
Volume
15
Issue
3
fYear
2009
Firstpage
792
Lastpage
798
Abstract
By adjusting the Al and In concentration of AlGaInAs quantum dots (QDs), their morphologic and spectral properties (i.e., size, height, density, and emission wavelength) can be engineered partly independently. In this paper, we report that this tunability can be used to improve QD laser properties and to realize QD lasers at wavelengths not achievable with the commonly used (Ga) InAs QDs. We show that using tailored AlGaInAs QDs grown on GaAs substrate, the device properties of QD lasers can be improved with respect to material gain, accessible wavelength range, and temperature stability of the wavelength. In particular, we report that the material gain in QD lasers can be notably increased (by a factor of 2.1). Furthermore, we demonstrate QD lasers with application key wavelengths in the range between 760 and 920 nm. The presented short-wavelength ( ~ 760 nm) QD lasers exhibit characteristics comparable to state-of-the-art quantum well (QW) lasers (light output > 20 mW, sidemode suppression ratios ~ 40 dB, Itr = 43 mA). We also demonstrate that AlGaInAs QDs can be used to fabricate QD lasers with extremely high temperature stabilities of the wavelength (0.072 nm/K).
Keywords
III-V semiconductors; aluminium compounds; gallium arsenide; gallium compounds; indium compounds; laser beams; laser tuning; optical fabrication; quantum dot lasers; quantum well lasers; AlGaInAs; GaAs; QD laser fabricaltion; laser material gain; laser tuning; quantum dot laser; quantum well laser; wavelength 760 nm to 920 nm; AlGaInAs; QD laser; Stranski–Krastanow growth; epitaxy; gain; quantum dot (QD) engineering; self-assembled QDs; short wavelength;
fLanguage
English
Journal_Title
Selected Topics in Quantum Electronics, IEEE Journal of
Publisher
ieee
ISSN
1077-260X
Type
jour
DOI
10.1109/JSTQE.2008.2011493
Filename
4799150
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