• DocumentCode
    1188545
  • Title

    Characterization of high-resistivity poly-CdZnTe thick films grown by thermal evaporation method

  • Author

    Kim, K.H. ; Na, Y.H. ; Park, Y.J. ; Jung, T.R. ; Kim, S.U. ; Hong, J.K.

  • Author_Institution
    Dept. of Phys., Korea Univ., Seoul, South Korea
  • Volume
    51
  • Issue
    6
  • fYear
    2004
  • Firstpage
    3094
  • Lastpage
    3097
  • Abstract
    The high-resistivity polycrystalline CdZnTe thick films are grown by thermal evaporation method. The electrical properties of polycrystalline CdZnTe having high resistivity were investigated using time of flight technique. We have measured the average drift mobility and mobility lifetime of polycrystalline CdZnTe. In the comparison of annealed samples at different conditions, the variation of resistivity in the polycrystalline CdZnTe is considered to be related to the fluctuation of carrier concentration. From the analysis of transient photocurrent of time of flight based on multiple trapping model, we have found that the two dominant localized states which is considered to be related to the Cd vacancy (EV+0.36 eV), and grain boundary defects (EV+0.75 eV) play a dominant role in increasing resistivity through compensation process.
  • Keywords
    carrier mobility; electrical resistivity; grain boundaries; localised states; semiconductor counters; thick films; vacancies (crystal); Cd vacancy; annealed samples; average drift mobility; carrier concentration fluctuation; charge collection efficiency; compensation process; electrical properties; grain boundary defects; high-resistivity polycrystalline CdZnTe thick films; localized states; mobility lifetime; multiple trapping model; thermal evaporation method; time of flight technique; transient photocurrent; Annealing; Conductivity; Leak detection; Leakage current; Optical materials; Thick films; Transient analysis; X-ray detection; X-ray detectors; Zinc;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.2004.839084
  • Filename
    1369441