DocumentCode
1188545
Title
Characterization of high-resistivity poly-CdZnTe thick films grown by thermal evaporation method
Author
Kim, K.H. ; Na, Y.H. ; Park, Y.J. ; Jung, T.R. ; Kim, S.U. ; Hong, J.K.
Author_Institution
Dept. of Phys., Korea Univ., Seoul, South Korea
Volume
51
Issue
6
fYear
2004
Firstpage
3094
Lastpage
3097
Abstract
The high-resistivity polycrystalline CdZnTe thick films are grown by thermal evaporation method. The electrical properties of polycrystalline CdZnTe having high resistivity were investigated using time of flight technique. We have measured the average drift mobility and mobility lifetime of polycrystalline CdZnTe. In the comparison of annealed samples at different conditions, the variation of resistivity in the polycrystalline CdZnTe is considered to be related to the fluctuation of carrier concentration. From the analysis of transient photocurrent of time of flight based on multiple trapping model, we have found that the two dominant localized states which is considered to be related to the Cd vacancy (EV+0.36 eV), and grain boundary defects (EV+0.75 eV) play a dominant role in increasing resistivity through compensation process.
Keywords
carrier mobility; electrical resistivity; grain boundaries; localised states; semiconductor counters; thick films; vacancies (crystal); Cd vacancy; annealed samples; average drift mobility; carrier concentration fluctuation; charge collection efficiency; compensation process; electrical properties; grain boundary defects; high-resistivity polycrystalline CdZnTe thick films; localized states; mobility lifetime; multiple trapping model; thermal evaporation method; time of flight technique; transient photocurrent; Annealing; Conductivity; Leak detection; Leakage current; Optical materials; Thick films; Transient analysis; X-ray detection; X-ray detectors; Zinc;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.2004.839084
Filename
1369441
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