Title :
Influence of contact distance on the appearance of vacuum arcs with different AMF contacts
Author :
Steinke, Kathrin ; Lindmayer, Manfred
Author_Institution :
Inst. fur Hochspannungstechnik und Elektrische Energieanlagen, Tech. Univ. of Braunschweig, Germany
Abstract :
Measurements with vacuum interrupters equipped with bipolar axial magnetic field (AMF) contacts have shown that the post-arc current magnitude and its duration fall with shortened arcing time, and decreasing gap distance, respectively. Simulations of post-arc currents point out that this dependency may result either from different arc diameters or different ion densities around current zero. To clarify this, high-speed movies of vacuum arcs up to 60 kA root mean square were taken, using contacts with a bipolar and quadrupolar axial magnetic field structure. The gap distance was varied by delayed contact opening. Moreover, switching experiments with sealed experimental interrupters under 36 kV conditions with a bipolar AMF arrangement in comparison with a quadrupolar arrangement showed that the bipolar contacts yielded higher interruption capability, in correlation with lower post-arc currents. In order to study the reasons for these phenomena, optical investigations of the arc appearance were carried out under variation of the relevant parameters.
Keywords :
plasma density; plasma diagnostics; plasma simulation; plasma transport processes; vacuum arcs; vacuum circuit breakers; vacuum interrupters; 36 kV; 60 kA; bipolar axial magnetic field contacts; ion densities; optical investigations; post-arc current simulations; vacuum arcs; vacuum interrupters; Current measurement; Delay; High speed optical techniques; Interrupters; Magnetic field measurement; Magnetic fields; Motion pictures; Root mean square; Time measurement; Vacuum arcs; Axial magnetic field; axial magnetic field (AMF) contact; bipolar; high-speed movies; quadrupolar; vacuum arc modes; vacuum circuit breaker; vacuum interrupter;
Journal_Title :
Plasma Science, IEEE Transactions on
DOI :
10.1109/TPS.2005.856508