DocumentCode :
1189641
Title :
Proton tolerance of advanced SiGe HBTs fabricated on different substrate materials
Author :
Comeau, Jonathan P. ; Sutton, Akil K. ; Haugerud, Becca M. ; Cressler, John D. ; Kuo, Wei-Min Lance ; Marshall, Paul W. ; Reed, Robert A. ; Karroy, Arjun ; Van Art, Roger
Author_Institution :
Sch. of Electr. & Comput. Eng., Georgia Inst. of Technol., Atlanta, GA, USA
Volume :
51
Issue :
6
fYear :
2004
Firstpage :
3743
Lastpage :
3747
Abstract :
The proton tolerance of SiGe heterojunction bipolar transistors (HBTs) fabricated on a variety of substrate materials is investigated for the first time. The present SiGe HBT BiCMOS technology represents only the second commercially-available SiGe process to be reported for radiation effects. SiGe HBT dc and ac performance is compared for devices fabricated on silicon-on-insulator (SOI), low resistivity, and high resistivity silicon substrates, and all are found to be total dose tolerant to multi-Mrad radiation levels. We also compare these radiation results to those previously reported for other commercially-available SiGe technologies.
Keywords :
BiCMOS integrated circuits; Ge-Si alloys; heterojunction bipolar transistors; proton effects; semiconductor heterojunctions; silicon-on-insulator; SOI; SiGe; SiGe HBT BiCMOS technology; SiGe HBT ac performance; SiGe HBT dc performance; SiGe heterojunction bipolar transistor fabrication; dose tolerant; high resistivity silicon substrates; low resistivity silicon substrates; multiMrad radiation levels; proton tolerance; radiation effects; silicon-on-insulator; substrate materials; BiCMOS integrated circuits; CMOS technology; Conductivity; Germanium silicon alloys; Heterojunction bipolar transistors; Protons; Silicon germanium; Silicon on insulator technology; Space technology; Substrates;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.2004.839253
Filename :
1369552
Link To Document :
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