Title :
In situ magnetoresistance measurements of a nanoconstricted nickel-iron film with in-plane configuration
Author_Institution :
Corp. Res. Dev. Center, Toshiba Corp., Kawasaki, Japan
Abstract :
A test element (TE) with an Ni-Fe point contact (PC) in planar configuration was fabricated using an etching process with a horizontal incidence ion beam. Successive in situ magnetoresistance (MR) measurements were carried out in the etching apparatus without breaking the vacuum to prevent the oxidation of the PC. The TE showed the MR ratio around 12%, which was much larger than an anisotropic MR ratio of the film. It showed low (high) resistance with a magnetic field direction of parallel (antiparallel) magnetic geometry of the pinned and free area.
Keywords :
enhanced magnetoresistance; etching; magnetic domains; magnetic fields; magnetic thin films; nickel alloys; point contacts; MR measurement; MR ratio; Ni-Fe point contact; NiFe; etching process; horizontal incidence ion beam; magnetic domains; magnetic field direction; magnetoresistance measurement; nanoconstricted nickel-iron film; nanotechnology; nickel alloys; planar configuration; test element; Anisotropic magnetoresistance; Electrical resistance measurement; Etching; Ion beams; Magnetic anisotropy; Magnetic field measurement; Magnetic films; Oxidation; Tellurium; Testing; Magnetic domains; magnetoresistance; nanotechnology; nickel alloys;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.2005.854665
