DocumentCode :
1189997
Title :
Characteristics of the Al2O3 barrier with CoFeB pinned Layer in magnetic tunnel junctions
Author :
Bae, Ji Young ; Lim, Woo Chang ; Kim, Hyun Jeong ; Kim, Tae Wan ; Lee, Taek Dong
Author_Institution :
Korea Adv. Energy Res. Inst., Daejeon, South Korea
Volume :
41
Issue :
10
fYear :
2005
Firstpage :
2676
Lastpage :
2678
Abstract :
The magnetoresistance (MR) ratio of magnetic tunnel junctions (MTJs) depends on the structure and characteristics of the interface between ferromagnetic electrode and insulating layer. In order to understand the role of an amorphous layer as an electrode, the amorphous CoFeB and the crystalline CoFe were used for the pinned layers in MTJs and their properties were compared. When the CoFeB was used for the pinned layer, the MR ratio was higher than that of the CoFe pinned layer after annealing process. The reason for the higher MR of the CoFeB pinned layers are considered due to the chemically sharp interface formation. The chemically sharp interface means that B from the pinned layer gathers excess oxygen and Mn diffusion from the antiferromagnetic layer during the annealing is reduced by the amorphous CoFeB layer.
Keywords :
aluminium alloys; amorphous magnetic materials; annealing; interface magnetism; tunnelling magnetoresistance; MR ratio; MTJ; amorphous electrode; amorphous layer; annealing process; antiferromagnetic layer; chemically clean interface; chemically sharp interface; ferromagnetic electrode; insulating layer; magnetic tunnel junctions; magnetoresistance ratio; Amorphous materials; Annealing; Chemicals; Crystallization; Electrodes; Insulation; Magnetic tunneling; Sputtering; Temperature; Tunneling magnetoresistance; Chemically clean interface; CoFeB amorphous electrode; magnetic tunnel junction (MTJ);
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.2005.855297
Filename :
1519085
Link To Document :
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