DocumentCode
1191262
Title
Emulating media defect corrosion
Author
Dai, Qing ; Prada-Silva, Guillermo ; Yen, Bing K. ; Marchon, Bruno ; Rettner, C.T.
Author_Institution
San Jose Res. Center, Hitachi Global Storage Technol., San Jose, CA, USA
Volume
41
Issue
10
fYear
2005
Firstpage
3055
Lastpage
3057
Abstract
This paper presents studies designed toward understanding media defect corrosion. Focused ion beam technology is used to create well-defined defects exposing alloys of interest. Temperature and humidity stressing is employed to facilitate defect corrosion. Atomic force microscopy is used to characterize the defects before and after environmental stressing. It is found that corrosion growth is largely affected by the exposed alloy corrosion sensitivity. Interaction with overcoat type and lubricant is also discussed.
Keywords
atomic force microscopy; corrosion protection; electrochemistry; focused ion beam technology; lubricants; alloy corrosion sensitivity; atomic force microscopy; corrosion growth; electrochemistry; focused ion beam technology; lubricant; media defect corrosion; Atomic force microscopy; Atomic measurements; Corrosion; Force measurement; Ion beams; Lubricants; Material storage; Scanning electron microscopy; Silicon compounds; Substrates; Electrochemistry; media defect corrosion;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/TMAG.2005.855258
Filename
1519205
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