Title :
Emulating media defect corrosion
Author :
Dai, Qing ; Prada-Silva, Guillermo ; Yen, Bing K. ; Marchon, Bruno ; Rettner, C.T.
Author_Institution :
San Jose Res. Center, Hitachi Global Storage Technol., San Jose, CA, USA
Abstract :
This paper presents studies designed toward understanding media defect corrosion. Focused ion beam technology is used to create well-defined defects exposing alloys of interest. Temperature and humidity stressing is employed to facilitate defect corrosion. Atomic force microscopy is used to characterize the defects before and after environmental stressing. It is found that corrosion growth is largely affected by the exposed alloy corrosion sensitivity. Interaction with overcoat type and lubricant is also discussed.
Keywords :
atomic force microscopy; corrosion protection; electrochemistry; focused ion beam technology; lubricants; alloy corrosion sensitivity; atomic force microscopy; corrosion growth; electrochemistry; focused ion beam technology; lubricant; media defect corrosion; Atomic force microscopy; Atomic measurements; Corrosion; Force measurement; Ion beams; Lubricants; Material storage; Scanning electron microscopy; Silicon compounds; Substrates; Electrochemistry; media defect corrosion;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.2005.855258