• DocumentCode
    1191262
  • Title

    Emulating media defect corrosion

  • Author

    Dai, Qing ; Prada-Silva, Guillermo ; Yen, Bing K. ; Marchon, Bruno ; Rettner, C.T.

  • Author_Institution
    San Jose Res. Center, Hitachi Global Storage Technol., San Jose, CA, USA
  • Volume
    41
  • Issue
    10
  • fYear
    2005
  • Firstpage
    3055
  • Lastpage
    3057
  • Abstract
    This paper presents studies designed toward understanding media defect corrosion. Focused ion beam technology is used to create well-defined defects exposing alloys of interest. Temperature and humidity stressing is employed to facilitate defect corrosion. Atomic force microscopy is used to characterize the defects before and after environmental stressing. It is found that corrosion growth is largely affected by the exposed alloy corrosion sensitivity. Interaction with overcoat type and lubricant is also discussed.
  • Keywords
    atomic force microscopy; corrosion protection; electrochemistry; focused ion beam technology; lubricants; alloy corrosion sensitivity; atomic force microscopy; corrosion growth; electrochemistry; focused ion beam technology; lubricant; media defect corrosion; Atomic force microscopy; Atomic measurements; Corrosion; Force measurement; Ion beams; Lubricants; Material storage; Scanning electron microscopy; Silicon compounds; Substrates; Electrochemistry; media defect corrosion;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.2005.855258
  • Filename
    1519205