Title :
A precise measurement of QHR at NIM [quantized Hall resistance]
Author :
Zhang, Zhonghua ; Wang, Dengan ; Hu, Zhi ; Zhen, Jiu ; He, Qing ; Qiao, Weichuan ; Bliek, L. ; Hein, G. ; Kowalski, W. ; Ebeling, K.J. ; Bruus, H.
Author_Institution :
Nat. Inst. of Metrol., Beijing, China
fDate :
12/1/1991 12:00:00 AM
Abstract :
Equipment for precise measurement of the quantized Hall resistance (QHR) at the National Institute of Metrology (NIM), Beijing, China, is described. The essential parts in this equipment are a resistance comparator of one-to-one ratio with a comparison uncertainty of 3×10-8 and two specially designed resistor networks used for determining of the ratio between 12906.4035 Ω of QHR at i=2 and 10 kΩ or 1 kΩ. The transfer procedure from QHR to 10 kΩ or 1 kΩ can be completed easily with this equipment by a few one-to-one comparisons with a total uncertainty of 5×10-8
Keywords :
electric resistance measurement; measurement standards; quantum Hall effect; 1 kohm; 10 kohm; 12906.4035 ohm; China; GaAs-GaAlAs heterostructure; National Institute of Metrology; quantized Hall resistance; quantum Hall effect; resistance comparator; resistance ratio; resistor networks; Electrical resistance measurement; Hall effect; Helium; Laboratories; Metrology; Potentiometers; Resistors; Switches; Uncertainty; Voltage;
Journal_Title :
Instrumentation and Measurement, IEEE Transactions on