An advanced IC processing laboratory at the University of Notre Dame

Author

Bernstein, Gary H. ; Minniti, Robert J. ; Huang, Xiaokang

Author_Institution

Dept. of Electr. Eng., Notre Dame Univ., IN, USA

Volume

37

Issue

4

fYear

1994

fDate

11/1/1994 12:00:00 AM

Firstpage

334

Lastpage

340

Abstract

A new integrated circuits fabrication laboratory course was developed at the University of Notre Dame, USA. The course was taught first to graduate students, who helped to develop the processes, and then to seniors. Complementary metal oxide semiconductor (CMOS) test circuits of up to 150 transistors per circuit, with 5-micron minimum geometries on 4-inch wafers were successfully fabricated. In this paper, the authors discuss the construction, funding, and operation of the facility in which the course is taught. They also discuss the fabrication process used by the students, class assignments, and results of the first semester in which the course was offered to seniors

Keywords

CMOS integrated circuits; educational courses; electronic engineering; laboratories; CMOS test circuits; IC processing laboratory; USA; class assignments; graduate students; integrated circuits fabrication laboratory course; seniors; students; transistors; university; Circuit testing; Engineering profession; Fabrication; Integrated circuit manufacture; Laboratories; Microelectronics; Semiconductor device manufacture; Solid state circuits; Springs; Very large scale integration;

fLanguage

English

Journal_Title

Education, IEEE Transactions on

Publisher

ieee

ISSN

0018-9359

Type

jour

DOI

10.1109/13.330100

Filename

330100