DocumentCode :
1192502
Title :
Molecular dynamics investigation for thin film growth morphology of Ni/Ni(111)
Author :
Lee, Soon-Gun ; Chung, Yong-Chae
Author_Institution :
Dept. of Ceramic Eng., Hanyang Univ., Seoul, South Korea
Volume :
41
Issue :
10
fYear :
2005
Firstpage :
3431
Lastpage :
3433
Abstract :
Using molecular dynamics simulation, the morphology of Ni thin film growth on Ni(111) substrate according to the incident energy of adatoms was investigated. Ni atoms apparently favored the island growth mode at low incident energy. The growth mode of Ni film was, however, changed to follow layer-by-layer growth mode for the incident energy of 6 eV. The steering effect due to atomic attraction, which results in rougher surface, was significantly observed at low incident energy. The local acceleration for the corresponding steering effect was quantitatively calculated.
Keywords :
metallic thin films; molecular dynamics method; nickel alloys; substrates; 6 eV; Ni-Ni; adatoms; atomic attraction; incident energy; island growth; molecular dynamics; steering effect; thin film growth morphology; Acceleration; Atomic layer deposition; Power engineering and energy; Rough surfaces; Sputtering; Substrates; Surface morphology; Surface roughness; Temperature; Transistors; Growth morphology; Ni/Ni(111); molecular dynamics simulation; steering effect;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.2005.858287
Filename :
1519329
Link To Document :
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