DocumentCode
1192502
Title
Molecular dynamics investigation for thin film growth morphology of Ni/Ni(111)
Author
Lee, Soon-Gun ; Chung, Yong-Chae
Author_Institution
Dept. of Ceramic Eng., Hanyang Univ., Seoul, South Korea
Volume
41
Issue
10
fYear
2005
Firstpage
3431
Lastpage
3433
Abstract
Using molecular dynamics simulation, the morphology of Ni thin film growth on Ni(111) substrate according to the incident energy of adatoms was investigated. Ni atoms apparently favored the island growth mode at low incident energy. The growth mode of Ni film was, however, changed to follow layer-by-layer growth mode for the incident energy of 6 eV. The steering effect due to atomic attraction, which results in rougher surface, was significantly observed at low incident energy. The local acceleration for the corresponding steering effect was quantitatively calculated.
Keywords
metallic thin films; molecular dynamics method; nickel alloys; substrates; 6 eV; Ni-Ni; adatoms; atomic attraction; incident energy; island growth; molecular dynamics; steering effect; thin film growth morphology; Acceleration; Atomic layer deposition; Power engineering and energy; Rough surfaces; Sputtering; Substrates; Surface morphology; Surface roughness; Temperature; Transistors; Growth morphology; Ni/Ni(111); molecular dynamics simulation; steering effect;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/TMAG.2005.858287
Filename
1519329
Link To Document