• DocumentCode
    1192502
  • Title

    Molecular dynamics investigation for thin film growth morphology of Ni/Ni(111)

  • Author

    Lee, Soon-Gun ; Chung, Yong-Chae

  • Author_Institution
    Dept. of Ceramic Eng., Hanyang Univ., Seoul, South Korea
  • Volume
    41
  • Issue
    10
  • fYear
    2005
  • Firstpage
    3431
  • Lastpage
    3433
  • Abstract
    Using molecular dynamics simulation, the morphology of Ni thin film growth on Ni(111) substrate according to the incident energy of adatoms was investigated. Ni atoms apparently favored the island growth mode at low incident energy. The growth mode of Ni film was, however, changed to follow layer-by-layer growth mode for the incident energy of 6 eV. The steering effect due to atomic attraction, which results in rougher surface, was significantly observed at low incident energy. The local acceleration for the corresponding steering effect was quantitatively calculated.
  • Keywords
    metallic thin films; molecular dynamics method; nickel alloys; substrates; 6 eV; Ni-Ni; adatoms; atomic attraction; incident energy; island growth; molecular dynamics; steering effect; thin film growth morphology; Acceleration; Atomic layer deposition; Power engineering and energy; Rough surfaces; Sputtering; Substrates; Surface morphology; Surface roughness; Temperature; Transistors; Growth morphology; Ni/Ni(111); molecular dynamics simulation; steering effect;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.2005.858287
  • Filename
    1519329