DocumentCode
1192516
Title
Threshold-Voltage Modeling of Body-Tied FinFETs (Bulk FinFETs)
Author
Choi, Byung-Kil ; Han, Kyoung-Rok ; Kim, Young Min ; Park, Young June ; Lee, Jong-Ho
Author_Institution
Sch. of Electr. Eng. & Comput. Sci., Kyungpook Nat. Univ., Daegu
Volume
54
Issue
3
fYear
2007
fDate
3/1/2007 12:00:00 AM
Firstpage
537
Lastpage
545
Abstract
The threshold voltages Vth of the body-tied double/triple-gate MOSFETs (bulk FinFETs) implemented on bulk silicon (Si) wafers were modeled systematically and compared with data obtained from 3-D device simulation. The threshold-voltage behaviors of the bulk FinFETs were modeled, for the first time, based on charge sharing. For the simplified Vth model, we considered not only short-channel effect (SCE) and narrow-width effect but also 3-D charge sharing at the corner. Only one fitting parameter is introduced to reflect the SCE in the fin body. The model predicted the Vth behavior with fin body thickness, body doping concentration, gate height, gate length, and corner shape of the fin body well. Our compact model makes an accurate prediction of Vth and shows good agreement with 3-D simulation data
Keywords
MOSFET; elemental semiconductors; semiconductor device models; silicon; NEW; SCE; Si; body tied; bulk FinFET; corner effect; narrow width effect; short channel effect; threshold voltage modeling; CMOS technology; FinFETs; MOSFETs; Predictive models; Semiconductor device modeling; Semiconductor process modeling; Shape; Silicon; Threshold voltage; Tunneling; Body-tied; bulk FinFET; corner effect; modeling; narrow-width effect (NWE); short-channel effect (SCE); threshold voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2006.890374
Filename
4114835
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