• DocumentCode
    1192516
  • Title

    Threshold-Voltage Modeling of Body-Tied FinFETs (Bulk FinFETs)

  • Author

    Choi, Byung-Kil ; Han, Kyoung-Rok ; Kim, Young Min ; Park, Young June ; Lee, Jong-Ho

  • Author_Institution
    Sch. of Electr. Eng. & Comput. Sci., Kyungpook Nat. Univ., Daegu
  • Volume
    54
  • Issue
    3
  • fYear
    2007
  • fDate
    3/1/2007 12:00:00 AM
  • Firstpage
    537
  • Lastpage
    545
  • Abstract
    The threshold voltages Vth of the body-tied double/triple-gate MOSFETs (bulk FinFETs) implemented on bulk silicon (Si) wafers were modeled systematically and compared with data obtained from 3-D device simulation. The threshold-voltage behaviors of the bulk FinFETs were modeled, for the first time, based on charge sharing. For the simplified Vth model, we considered not only short-channel effect (SCE) and narrow-width effect but also 3-D charge sharing at the corner. Only one fitting parameter is introduced to reflect the SCE in the fin body. The model predicted the Vth behavior with fin body thickness, body doping concentration, gate height, gate length, and corner shape of the fin body well. Our compact model makes an accurate prediction of Vth and shows good agreement with 3-D simulation data
  • Keywords
    MOSFET; elemental semiconductors; semiconductor device models; silicon; NEW; SCE; Si; body tied; bulk FinFET; corner effect; narrow width effect; short channel effect; threshold voltage modeling; CMOS technology; FinFETs; MOSFETs; Predictive models; Semiconductor device modeling; Semiconductor process modeling; Shape; Silicon; Threshold voltage; Tunneling; Body-tied; bulk FinFET; corner effect; modeling; narrow-width effect (NWE); short-channel effect (SCE); threshold voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2006.890374
  • Filename
    4114835