• DocumentCode
    1193123
  • Title

    Electromagnetic micromirror array with single-crystal silicon mirror plate and aluminum spring

  • Author

    Ji, Chang-Hyeon ; Kim, Yong-Kweon

  • Author_Institution
    Sch. of Electr. Eng. & Comput. Sci., Seoul Nat. Univ., South Korea
  • Volume
    21
  • Issue
    3
  • fYear
    2003
  • fDate
    3/1/2003 12:00:00 AM
  • Firstpage
    584
  • Lastpage
    590
  • Abstract
    We have designed and fabricated an addressable 4 × 4 array of micromirrors capable of providing up to 90° of angular deflection. Each micromirror comprises a single-crystalline silicon mirror plate supported by aluminum springs, which provides an extremely flat reflective surface and a compliant spring material that enables the integration of the device into a limited area without mitigating its performance (i.e., total angular deflection). The device is fabricated using a combination of surface and bulk micromachining processes, such as electroplating, bulk wet etching and XeF2 etch processes. Selective actuation is accomplished by the use of an electrostatic clamping force on each mirror plate. A mirror rotation angle of more than 80° can be obtained by applying an external magnetic field, and this angle can be further increased by the use of an electrostatic force. The designed structure can be used in microphotonic applications.
  • Keywords
    electromagnetic actuators; electroplating; etching; microactuators; micromachining; micromirrors; optical arrays; optical fabrication; sputter etching; Al; Al spring; Si; XeF2; XeF2 etch processes; addressable 4×4 array; angular deflection; bulk micromachining; bulk wet etching; compliant spring material; device integration; electromagnetic micromirror array; electroplating; electrostatic clamping force; external magnetic field; extremely flat reflective surface; microphotonic applications; mirror rotation angle; selective actuation; single-crystal Si mirror plate; surface micromachining; total angular deflection; Aluminum; Clamps; Electrostatics; Magnetic fields; Micromachining; Micromirrors; Mirrors; Silicon; Springs; Wet etching;
  • fLanguage
    English
  • Journal_Title
    Lightwave Technology, Journal of
  • Publisher
    ieee
  • ISSN
    0733-8724
  • Type

    jour

  • DOI
    10.1109/JLT.2003.809549
  • Filename
    1197921