DocumentCode
1193123
Title
Electromagnetic micromirror array with single-crystal silicon mirror plate and aluminum spring
Author
Ji, Chang-Hyeon ; Kim, Yong-Kweon
Author_Institution
Sch. of Electr. Eng. & Comput. Sci., Seoul Nat. Univ., South Korea
Volume
21
Issue
3
fYear
2003
fDate
3/1/2003 12:00:00 AM
Firstpage
584
Lastpage
590
Abstract
We have designed and fabricated an addressable 4 × 4 array of micromirrors capable of providing up to 90° of angular deflection. Each micromirror comprises a single-crystalline silicon mirror plate supported by aluminum springs, which provides an extremely flat reflective surface and a compliant spring material that enables the integration of the device into a limited area without mitigating its performance (i.e., total angular deflection). The device is fabricated using a combination of surface and bulk micromachining processes, such as electroplating, bulk wet etching and XeF2 etch processes. Selective actuation is accomplished by the use of an electrostatic clamping force on each mirror plate. A mirror rotation angle of more than 80° can be obtained by applying an external magnetic field, and this angle can be further increased by the use of an electrostatic force. The designed structure can be used in microphotonic applications.
Keywords
electromagnetic actuators; electroplating; etching; microactuators; micromachining; micromirrors; optical arrays; optical fabrication; sputter etching; Al; Al spring; Si; XeF2; XeF2 etch processes; addressable 4×4 array; angular deflection; bulk micromachining; bulk wet etching; compliant spring material; device integration; electromagnetic micromirror array; electroplating; electrostatic clamping force; external magnetic field; extremely flat reflective surface; microphotonic applications; mirror rotation angle; selective actuation; single-crystal Si mirror plate; surface micromachining; total angular deflection; Aluminum; Clamps; Electrostatics; Magnetic fields; Micromachining; Micromirrors; Mirrors; Silicon; Springs; Wet etching;
fLanguage
English
Journal_Title
Lightwave Technology, Journal of
Publisher
ieee
ISSN
0733-8724
Type
jour
DOI
10.1109/JLT.2003.809549
Filename
1197921
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