DocumentCode
1193143
Title
Design and fabrication of GaAs-GaAlAs micromachined tunable filter with thermal strain control
Author
Amano, T. ; Koyama, F. ; Hino, T. ; Arai, M. ; Mastutani, A.
Author_Institution
Microsystem Res. Center, Tokyo Inst. of Technol., Yokohama, Japan
Volume
21
Issue
3
fYear
2003
fDate
3/1/2003 12:00:00 AM
Firstpage
596
Lastpage
601
Abstract
In this paper, we present the design and fabrication of a novel GaAlAs-GaAs micromachined vertical cavity filter with a thermal strain control layer for wide wavelength tuning. The integration of a thermal strain control layer and heating element enables wavelength tuning induced by heating. The proposed tunable filter under thermal tuning operation provides us large tuning range over conventional micromachined tunable filters using electrostatic force. The calculated result shows a possibility of large continuous tuning range of over 100 nm. We fabricated a micromachined GaAlAs-GaAs vertical cavity filter with a strain control layer. The temperature dependence of the filter can be freely controlled either with temperature insensitive operation or with an enhanced temperature dependence, which depends on the thickness of the thermal strain control layer. We demonstrate a thermal wavelength tuning of 53 nm with a low tuning voltage of 6.1 V for the first time.
Keywords
III-V semiconductors; aluminium compounds; distributed Bragg reflector lasers; gallium arsenide; integrated optics; micro-optics; micromachining; optical fabrication; optical filters; optical tuning; strain control; surface emitting lasers; 6.1 V; GaAlAs-GaAs micromachined vertical cavity filter; GaAs-GaAlAs; GaAs-GaAlAs micromachined tunable filter; continuous tuning range; distributed Bragg reflector; heating element; low tuning voltage; micromachined VCSEL; reflection spectra; temperature dependence; temperature insensitive operation; thermal strain control; thermal tuning operation; thermal wavelength tuning; wide wavelength tuning; Electrostatics; Fabrication; Filters; Heating; Low voltage; Strain control; Temperature control; Temperature dependence; Thermal force; Thickness control;
fLanguage
English
Journal_Title
Lightwave Technology, Journal of
Publisher
ieee
ISSN
0733-8724
Type
jour
DOI
10.1109/JLT.2003.809541
Filename
1197923
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