DocumentCode
1193780
Title
One-mask process for silicon accelerometers on Pyrex glass utilising notching effect in inductively coupled plasma DRIE
Author
Iliescu, C. ; Miao, J.
Author_Institution
Sch. of Mech. & Production Eng., Nanyang Technol. Univ., Singapore, Singapore
Volume
39
Issue
8
fYear
2003
fDate
4/17/2003 12:00:00 AM
Firstpage
658
Lastpage
659
Abstract
A one-mask process technology is proposed to fabricate silicon capacitive accelerometers using comb drive structures. A doped silicon wafer is anodically bonded on Pyrex glass substrate. High aspect ratio silicon accelerometer structures are micromachined using deep reactive ion etching (DRIE) and released from the glass substrate by further DRIE due to its notching effect.
Keywords
accelerometers; capacitive sensors; elemental semiconductors; masks; micromachining; microsensors; silicon; sputter etching; wafer bonding; MEMS fabrication; Pyrex glass substrate; Si; anodic bonding; comb drive structure; doped silicon wafer; high aspect ratio microstructure; inductively coupled plasma DRIE; micromachining; notching effect; one-mask process technology; silicon capacitive accelerometer;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:20030407
Filename
1197985
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