Title :
Fabrication of L10-FePt thin films by rapid thermal annealing
Author :
Aimuta, K. ; Nishimura, K. ; Hashi, S. ; Inoue, M.
Author_Institution :
Dept. of Electr. & Electron. Eng., Toyohashi Univ. of Technol., Aichi, Japan
Abstract :
Fabrication of L10-FePt thin films by using conventional thermal annealing and indirect rapid thermal annealing is studied. By using conventional thermal annealing, L10-FePt thin films are fabricated over 500°C. By using the rapid thermal annealing, it was found that the formation temperature of L10-FePt thin films decreases effectively. In addition, this method enables to prevent the grain growth due to annealing.
Keywords :
ferromagnetic materials; iron alloys; lanthanum alloys; magnetic thin films; platinum alloys; rapid thermal annealing; FePt; formation temperature; grain growth; thermal annealing; thin film fabrication; Fabrication; Magnetic anisotropy; Magnetic films; Rapid thermal annealing; Sputtering; Substrates; Surface morphology; Temperature; Thermal engineering; Transistors; Average grain diameter; L1; film surface morphology; rapid thermal annealing;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.2005.854941
