DocumentCode
1194061
Title
The impact of single-wafer processing on semiconductor manufacturing
Author
Singh, Rajendra ; Fakhruddin, Mohammed ; Poole, Kelvin F.
Author_Institution
Holcombe Dept. of Electr., Clemson Univ., SC, USA
Volume
16
Issue
2
fYear
2003
fDate
5/1/2003 12:00:00 AM
Firstpage
96
Lastpage
101
Abstract
In this paper, we have described the importance of single-wafer processing (SWP) in semiconductor manufacturing. As compared to batch processing, reduced cycle time, better control of surface and interface properties, and reduced defect densities are some of the attractive features of SWP. We have provided the example of new SWP tools that have the answers to address virtually all process integration issues in dealing with new materials as well as conventional materials in ultra small dimensions. Driven by reduced I/O pitches, and emergence of system-on-chip, system-in-package or system-on-package as the driver of semiconductor growth, SWP tools have started to play an important role in the surface cleaning in IC assembly and packaging. Global acceptance of SWP in manufacturing can address the supply chain problem of the semiconductor industry.
Keywords
integrated circuit manufacture; rapid thermal processing; surface cleaning; IC assembly; IC manufacture; IC packaging; RTP; SWP tools; cycle time; defect densities; interface properties; process integration issues; rapid thermal processing; reduced I/O pitches; semiconductor manufacturing; single-wafer processing; surface cleaning; surface properties; yield optimization; Assembly systems; Integrated circuit packaging; Manufacturing processes; Pulp manufacturing; Semiconductor device manufacture; Semiconductor device packaging; Semiconductor growth; Semiconductor materials; Surface cleaning; System-on-a-chip;
fLanguage
English
Journal_Title
Semiconductor Manufacturing, IEEE Transactions on
Publisher
ieee
ISSN
0894-6507
Type
jour
DOI
10.1109/TSM.2003.810941
Filename
1198015
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