• DocumentCode
    1194061
  • Title

    The impact of single-wafer processing on semiconductor manufacturing

  • Author

    Singh, Rajendra ; Fakhruddin, Mohammed ; Poole, Kelvin F.

  • Author_Institution
    Holcombe Dept. of Electr., Clemson Univ., SC, USA
  • Volume
    16
  • Issue
    2
  • fYear
    2003
  • fDate
    5/1/2003 12:00:00 AM
  • Firstpage
    96
  • Lastpage
    101
  • Abstract
    In this paper, we have described the importance of single-wafer processing (SWP) in semiconductor manufacturing. As compared to batch processing, reduced cycle time, better control of surface and interface properties, and reduced defect densities are some of the attractive features of SWP. We have provided the example of new SWP tools that have the answers to address virtually all process integration issues in dealing with new materials as well as conventional materials in ultra small dimensions. Driven by reduced I/O pitches, and emergence of system-on-chip, system-in-package or system-on-package as the driver of semiconductor growth, SWP tools have started to play an important role in the surface cleaning in IC assembly and packaging. Global acceptance of SWP in manufacturing can address the supply chain problem of the semiconductor industry.
  • Keywords
    integrated circuit manufacture; rapid thermal processing; surface cleaning; IC assembly; IC manufacture; IC packaging; RTP; SWP tools; cycle time; defect densities; interface properties; process integration issues; rapid thermal processing; reduced I/O pitches; semiconductor manufacturing; single-wafer processing; surface cleaning; surface properties; yield optimization; Assembly systems; Integrated circuit packaging; Manufacturing processes; Pulp manufacturing; Semiconductor device manufacture; Semiconductor device packaging; Semiconductor growth; Semiconductor materials; Surface cleaning; System-on-a-chip;
  • fLanguage
    English
  • Journal_Title
    Semiconductor Manufacturing, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0894-6507
  • Type

    jour

  • DOI
    10.1109/TSM.2003.810941
  • Filename
    1198015