DocumentCode :
1194363
Title :
RF power performance of an LDMOSFET on high-resistivity SOI
Author :
Fiorenza, J.G. ; del Alamo, J.A.
Author_Institution :
Massachusetts Inst. of Technol., Cambridge, MA, USA
Volume :
26
Issue :
1
fYear :
2005
Firstpage :
29
Lastpage :
31
Abstract :
This paper describes the RF power performance of an LDMOSFET technology on high-resistivity silicon-on-insulator wafers. The technology has an on-state breakdown voltage of greater than 10 V, and an off-state breakdown voltage of greater than 20 V. This device technology is shown to have excellent RF power characteristics at frequencies from 1.9 to 5.8 GHz. At 1.9 GHz, a peak power-added efficiency (PAE) of 63% was achieved with an output power of up to 520 mW from a single RF power cell. At 5.8 GHz, a peak PAE of 35% was achieved with an output power of up to 125 mW from a single RF power cell.
Keywords :
electrical resistivity; power MOSFET; radiofrequency amplifiers; semiconductor device breakdown; silicon-on-insulator; 1.9 to 5.8 GHz; 125 mW; 520 mW; LDMOSFET; RF power amplifier; high-resistivity silicon-on-insulator wafers; off-state breakdown voltage; on-state breakdown voltage; peak power-added efficiency; Conductivity; Fabrication; Power amplifiers; Power generation; Radio frequency; Radiofrequency amplifiers; Silicon on insulator technology; Substrates; Thin film circuits; Wireless LAN; LDMOSFET; RF power amplifier; silicon-on-insulator (SOI);
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2004.839625
Filename :
1372686
Link To Document :
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