• DocumentCode
    1194363
  • Title

    RF power performance of an LDMOSFET on high-resistivity SOI

  • Author

    Fiorenza, J.G. ; del Alamo, J.A.

  • Author_Institution
    Massachusetts Inst. of Technol., Cambridge, MA, USA
  • Volume
    26
  • Issue
    1
  • fYear
    2005
  • Firstpage
    29
  • Lastpage
    31
  • Abstract
    This paper describes the RF power performance of an LDMOSFET technology on high-resistivity silicon-on-insulator wafers. The technology has an on-state breakdown voltage of greater than 10 V, and an off-state breakdown voltage of greater than 20 V. This device technology is shown to have excellent RF power characteristics at frequencies from 1.9 to 5.8 GHz. At 1.9 GHz, a peak power-added efficiency (PAE) of 63% was achieved with an output power of up to 520 mW from a single RF power cell. At 5.8 GHz, a peak PAE of 35% was achieved with an output power of up to 125 mW from a single RF power cell.
  • Keywords
    electrical resistivity; power MOSFET; radiofrequency amplifiers; semiconductor device breakdown; silicon-on-insulator; 1.9 to 5.8 GHz; 125 mW; 520 mW; LDMOSFET; RF power amplifier; high-resistivity silicon-on-insulator wafers; off-state breakdown voltage; on-state breakdown voltage; peak power-added efficiency; Conductivity; Fabrication; Power amplifiers; Power generation; Radio frequency; Radiofrequency amplifiers; Silicon on insulator technology; Substrates; Thin film circuits; Wireless LAN; LDMOSFET; RF power amplifier; silicon-on-insulator (SOI);
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2004.839625
  • Filename
    1372686