• DocumentCode
    1194808
  • Title

    Disperse pipe trench on silicon by electrochemical etching with pulsed voltage or pulsed illumination

  • Author

    Lin, J.-C. ; Tsai, W.-C. ; Chen, W.-L.

  • Author_Institution
    Dept. of Electron. Eng., St. John´´s Univ., Taipei
  • Volume
    43
  • Issue
    4
  • fYear
    2007
  • Firstpage
    247
  • Lastpage
    248
  • Abstract
    A novel electrochemical etching on silicon is proposed. A pulsed voltage or a pulsed illumination is used to make a pulsed anodic current that produces a magnetic field around the anodic current path. The Lorentz force centralises the hole accumulating path. Disperse pipe trench patterns can then be obtained
  • Keywords
    anodisation; electrochemistry; elemental semiconductors; etching; silicon; Lorentz force; Si; anodic current path; disperse pipe trench pattern; electrochemical etching; magnetic field; pulsed anodic current; pulsed illumination; pulsed voltage; silicon; wet etching;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:20073657
  • Filename
    4117480
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1194808