• DocumentCode
    1197318
  • Title

    Ion flux from the cathode region of a vacuum arc

  • Author

    Kutzner, Janusz ; Miller, H. Craig

  • Author_Institution
    Tech. Univ. of Poznan, Poland
  • Volume
    17
  • Issue
    5
  • fYear
    1989
  • fDate
    10/1/1989 12:00:00 AM
  • Firstpage
    688
  • Lastpage
    694
  • Abstract
    The properties of the ion flux generated in a vacuum arc are reviewed. The structure and distribution of mass erosion from individual cathode spots and the characteristics of current carriers from the cathode region at moderate arc currents are described. An appreciable ion flux (~10% of the total arc current) is emitted from the cathode of a vacuum arc. This ion flux is strongly peaked in the direction of the anode, although some ion flux may be seen even at angles below the plane of the cathode surface. The observed spatial distribution of the ion flux is expressed quite well as an exponential function of the solid angle. The ion flux is quite energetic, with average ion potentials much larger than the arc voltage, and generally contains a considerable fraction of multiply charged ions. The average ion potential and ion multiplicity increase significantly for cathode materials with higher arc voltages but decrease with increasing arc current for a particular material. The main theories concerning ion acceleration in cathode spots are the potential hump theory and the gas dynamic theory. Experimental data indicate that these theories serve reasonably well when used to predict the mean values of the charge state, ion potential, and ion energies for the ion flux, but are quite insufficient when compared with the results for the potentials and energies of individual ions
  • Keywords
    arcs (electric); plasma transport processes; anode; arc currents; cathode region; current carriers; ion flux; mass erosion; multiply charged ions; potential hump theory; spatial distribution; vacuum arc; Acceleration; Anodes; Cathodes; Electrodes; Electron emission; Plasma temperature; Solids; Sputtering; Vacuum arcs; Voltage;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/27.41183
  • Filename
    41183