• DocumentCode
    1198664
  • Title

    Polarization-dependent EXAFS studies of chemical and structural anisotropy in sputter-deposited Co78Cr22 films

  • Author

    Kemner, K.M. ; Harris, V.G. ; Elam, W.T. ; Lodder, C.J.

  • Author_Institution
    Naval Res. Lab., Washington, DC, USA
  • Volume
    30
  • Issue
    6
  • fYear
    1994
  • fDate
    11/1/1994 12:00:00 AM
  • Firstpage
    4017
  • Lastpage
    4019
  • Abstract
    Extended x-ray absorption fine structure measurements of a Co78Cr22 film were performed using normal and glancing incident radiation in order to investigate, respectively, the in-plane and out-of-plane local structure and chemistry. The Fourier transformed EXAFS data illustrates the presence of an anisotropy between the in-plane and out-of-plane structures around Co and Cr atoms. Analysis of the local environments around Co for the two sample orientations indicates the presence of Co-rich clusters, while fitting of the Cr environment indicates preferential ordering parallel to the film plane. These results are consistent with earlier reports of a high density of stacking faults perpendicular to the growth axis, supporting the interpretation that a platelet-like texturing exists within the columnar microstructure. Cr segregation parallel to the film plane provides diffusion paths allowing for transverse compositional inhomogeneities observed in TEM studies
  • Keywords
    EXAFS; chromium alloys; cobalt alloys; ferromagnetic materials; magnetic thin film devices; magnetic thin films; metal clusters; perpendicular magnetic anisotropy; perpendicular magnetic recording; segregation; sputtered coatings; stacking faults; transmission electron microscopy; Co-rich clusters; Co78Cr22; CoCr thin films; TEM studies; columnar microstructure; diffusion paths; extended x-ray absorption fine structure measurements; glancing incident radiation; local structure; perpendicular magnetic recording; platelet-like texturing; polarization-dependent EXAFS studies; preferential ordering; segregation; sputter-deposited films; stacking faults; structural anisotropy; transverse compositional inhomogeneities; Anisotropic magnetoresistance; Atomic measurements; Chemicals; Chemistry; Chromium; Electromagnetic wave absorption; Microstructure; Performance evaluation; Polarization; Stacking;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/20.333975
  • Filename
    333975