Vapor lubrication of thin film disks

Author

Coffey, Kevin R. ; Raman, Vedantham ; Staud, Norbert ; Pocker, Daryl J.

Author_Institution

Storage Syst. Div., IBM Corp., San Jose, CA, USA

Volume

30

Issue

6

fYear

1994

fDate

11/1/1994 12:00:00 AM

Firstpage

4146

Lastpage

4148

Abstract

A novel solvent-free coating process is described whereby hysteretic surface adsorption is used to provide uniform coatings of liquid perfluoropolyether lubricants onto thin film disks. The essence of the coating process is to place disks and lubricant in a closed atmosphere over at 170°C for one hour. It is observed that the resultant lubricant thickness on the disk surface is near 10 Å and that the resultant lubricant thickness on the disk surface is only weakly dependent upon the coating oven exposure time and temperature. The contact stop/start performance of the disks is equivalent to those lubricated by dipping

Keywords

hard discs; lubrication; magnetic thin film devices; vapour deposited coatings; 1 h; 10 angstrom; 170 degC; closed atmosphere; coating oven exposure time; coating oven temperature; contact stop/start performance; hysteretic surface adsorption; liquid perfluoropolyether lubricants; lubricant thickness; rigid disks; solvent-free coating process; thin film disks; uniform coatings; vapor lubrication; Bonding; Coatings; Hysteresis; Lubricants; Lubrication; Ovens; Sputtering; Temperature; Thickness control; Transistors;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.334017

Filename

334017