Title :
Vapor lubrication of thin film disks
Author :
Coffey, Kevin R. ; Raman, Vedantham ; Staud, Norbert ; Pocker, Daryl J.
Author_Institution :
Storage Syst. Div., IBM Corp., San Jose, CA, USA
fDate :
11/1/1994 12:00:00 AM
Abstract :
A novel solvent-free coating process is described whereby hysteretic surface adsorption is used to provide uniform coatings of liquid perfluoropolyether lubricants onto thin film disks. The essence of the coating process is to place disks and lubricant in a closed atmosphere over at 170°C for one hour. It is observed that the resultant lubricant thickness on the disk surface is near 10 Å and that the resultant lubricant thickness on the disk surface is only weakly dependent upon the coating oven exposure time and temperature. The contact stop/start performance of the disks is equivalent to those lubricated by dipping
Keywords :
hard discs; lubrication; magnetic thin film devices; vapour deposited coatings; 1 h; 10 angstrom; 170 degC; closed atmosphere; coating oven exposure time; coating oven temperature; contact stop/start performance; hysteretic surface adsorption; liquid perfluoropolyether lubricants; lubricant thickness; rigid disks; solvent-free coating process; thin film disks; uniform coatings; vapor lubrication; Bonding; Coatings; Hysteresis; Lubricants; Lubrication; Ovens; Sputtering; Temperature; Thickness control; Transistors;
Journal_Title :
Magnetics, IEEE Transactions on
