DocumentCode :
1200033
Title :
Room-temperature laser emission of GaInNAs-GaAs quantum wells grown on GaAs (111)B
Author :
Miguel-Sanchez, J. ; Guzman, A. ; Ulloa, J.M. ; Montes, M. ; Hierro, A. ; Munoz, Eugenio
Author_Institution :
Dept. de Ingenieria Electron., Univ. Politecnica de Madrid, Spain
Volume :
17
Issue :
11
fYear :
2005
Firstpage :
2271
Lastpage :
2273
Abstract :
We present room-temperature laser emission at 1.206 μm from GaInNAs-GaAs quantum-well (QW) laser diodes (LDs) grown on misoriented GaAs (111)B substrates for the first time. Details of the structure and the molecular beam epitaxial growth of the lasers are discussed. We found that the postgrowth rapid thermal annealing increased the optimum emission, while the in situ self annealing effect in these QWs is almost negligible. The optimum annealing cycle (30 s at 850/spl deg/C) is comparable to that found for the cladding-free GaInNAs single QW samples grown on GaAs (111)B. Finally, the optical and electrical characterization of these LD devices is presented. The LDs show a room-temperature threshold current density of 2.15 kA/cm2, with a differential quantum efficiency of 37%, under pulsed conditions.
Keywords :
III-V semiconductors; gallium arsenide; gallium compounds; indium compounds; molecular beam epitaxial growth; quantum well lasers; rapid thermal annealing; semiconductor epitaxial layers; semiconductor growth; stimulated emission; 1.206 mum; 293 to 298 K; 30 s; 850 degC; GaAs; GaAs (111)B substrates; GaInNAs-GaAs; GaInNAs-GaAs quantum wells; cladding-free QW samples; differential quantum efficiency; electrical characterization; in situ self annealing effect; laser diodes; molecular beam epitaxial growth; optical characterization; optimum annealing cycle; postgrowth rapid thermal annealing; room temperature laser emission; room-temperature current density; threshold current density; Diode lasers; Gallium arsenide; Molecular beam epitaxial growth; Optical devices; Optical pulses; Quantum well lasers; Rapid thermal annealing; Stimulated emission; Substrates; Threshold current; Annealing; optical communication; piezoelectric device; semiconductor epitaxial layers; semiconductor laser;
fLanguage :
English
Journal_Title :
Photonics Technology Letters, IEEE
Publisher :
ieee
ISSN :
1041-1135
Type :
jour
DOI :
10.1109/LPT.2005.857609
Filename :
1522290
Link To Document :
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