Title :
Generation of intense pulsed electron beams by the pseudospark discharge
Author :
Benker, Winfried ; Christiansen, Jens ; Frank, Klaus ; Gundel, Hartmut ; Hartmann, Werner ; Redel, Thomas ; Stetter, Michael
Author_Institution :
Inst. of Phys., Erlangen-Nuremberg Univ., West Germany
fDate :
10/1/1989 12:00:00 AM
Abstract :
A low-pressure gas discharge is presented as a source of intense pulsed electron beams. The pseudospark discharge emits a short-duration pinched electron beam during the breakdown phase. At voltages of typically 20 kV, approximately 10-20% of the total discharge current appears as the electron-beam current of typically 20 ns in duration. According to the breakdown voltage in the beam, a power density on the order of 109 W/cm2 is reached. Thus, this electron beam turns out to be a good tool for material processing, comparable to pulsed high-power lasers. Besides the drilling of holes into metals and insulators, an interesting application is the production of high-temperature superconducting thing YBa2Cu3O 7-x films. The electron beam is used to evaporate material from a stoichiometric 1-2-3 target. Experimental results concerning the propagation behavior in neutral gas, the electron energy distribution, and the interaction with matter are reported
Keywords :
electron beams; electron sources; sparks; 20 kV; 20 ns; YBa2Cu3O7-x; breakdown phase; drilling; electron energy distribution; evaporation; generation; high temperature superconducting thin film production; high-temperature superconducting thing YBa2Cu3 O7-x films; insulators; intense pulsed electron beams; low-pressure gas discharge; material processing; metals; neutral gas; power density; pseudospark discharge; pulsed high-power lasers; short-duration pinched electron beam; source; stoichiometric 1-2-3 target; Discharges; Electric breakdown; Electron beams; Fault location; Laser beams; Materials processing; Optical pulses; Pulse generation; Superconducting films; Voltage;
Journal_Title :
Plasma Science, IEEE Transactions on