Magnetic design of a cathodic arc and sputtering polyvalent source for vapour deposition

Author

Heras, N. ; Torrado, A. ; Barandiaran, Jose Manuel ; Goikoetxea, J.

Author_Institution

Dept. de Electr. y Electron., Pais Vasco Univ., Bilbao, Spain

Volume

30

Issue

6

fYear

1994

fDate

11/1/1994 12:00:00 AM

Firstpage

4683

Lastpage

4685

Abstract

This paper presents a new design for the magnetic field configurations in a polyvalent source which will allow cathodic arc and sputtering deposition processes from a rectangular target. The strength and direction, of magnetic fields are modelled by a software package, based on finite element analysis. In the sputtering magnetron mode, a high degree of parallelism of the magnetic field on the target surface is achieved, increasing the target erosion. Electromagnetic control of the cathodic arc spot will be done by coils alternately powered that create closed paths avoiding the spot fixation. Finally, the presented design is compared with a commercially available magnetron source

Keywords

arcs (electric); finite element analysis; ion sources; physics computing; software packages; sputter deposition; cathodic arc; closed paths; electromagnetic control; finite element analysis; magnetic design; magnetic field configurations; magnetron source; rectangular target; software package; spot fixation; sputtering deposition; sputtering magnetron mode; sputtering polyvalent source; target erosion; vapour deposition; Chemical vapor deposition; Coils; Finite element methods; Gaussian processes; Iron; Magnetic fields; Magnets; Software packages; Sputtering; Surface fitting;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.334189

Filename

334189