Title :
Magnetic properties of nanostructure controlled FeAlSi/FeAlSiO multilayers
Author :
Hiramoto, M. ; Inoue, O. ; Kugimiya, K.
Author_Institution :
Central Res. Labs., Matsushita Electr. Ind. Co. Ltd., Kyoto, Japan
fDate :
11/1/1994 12:00:00 AM
Abstract :
FeAlSi/FeAlSiO multilayers prepared by the pulse reactive sputtering were investigated. It was found that the layered structure had a high thermal stability over the ordering temperature of FeAlSi. In consequence, a saturation magnetic flux density of 1.4-1.5 T, a high isotropic initial permeability of 2000-10000 at 1 MHz were obtained even after the thermal annealing above 500°C
Keywords :
aluminium alloys; aluminium compounds; annealing; iron alloys; iron compounds; magnetic multilayers; magnetic permeability; magnetic transitions; silicon alloys; sputtered coatings; 1 MHz; 1.4 to 1.5 T; FeAlSi-FeAlSiO; FeAlSi/FeAlSiO multilayers; ordering temperature; permeability; pulse reactive sputtering; saturation magnetic flux density; thermal annealing; thermal stability; Annealing; Diffraction; Magnetic films; Magnetic multilayers; Magnetic properties; Nonhomogeneous media; Plasma measurements; Soft magnetic materials; Sputtering; Thermal stability;
Journal_Title :
Magnetics, IEEE Transactions on
