DocumentCode :
1201698
Title :
50-nm T-gate metamorphic GaAs HEMTs with fT of 440 GHz and noise figure of 0.7 dB at 26 GHz
Author :
Elgaid, K. ; McLelland, H. ; Holland, M. ; Moran, D.A.J. ; Stanley, C.R. ; Thayne, I.G.
Author_Institution :
Dept. of Electron. & Electr. Eng., Univ. of Glasgow, UK
Volume :
26
Issue :
11
fYear :
2005
Firstpage :
784
Lastpage :
786
Abstract :
GaAs-based transistors with the highest fT and lowest noise figure reported to date are presented in this letter. A 50-nm T-gate In0.52Al0.48As/In0.53Ga0.47As metamorphic high-electron mobility transistors (mHEMTs) on a GaAs substrate show fT of 440 GHz, fmax of 400 GHz, a minimum noise figure of 0.7 dB and an associated gain of 13 dB at 26 GHz, the latter at a drain current of 185 mA/mm and gm of 950 mS/mm. In addition, a noise figure of below 1.2 dB with 10.5 dB or higher associated gain at 26 GHz was demonstrated for drain currents in the range 40 to 470 mA/mm at a drain bias of 0.8 V. These devices are ideal for low noise and medium power applications at millimeter-wave frequencies.
Keywords :
III-V semiconductors; aluminium compounds; field effect MIMIC; gallium arsenide; high electron mobility transistors; indium compounds; millimetre wave field effect transistors; semiconductor device noise; 0.7 dB; 0.8 V; 13 dB; 440 GHz; 50 nm; GaAs HEMT; In0.52Al0.48As-In0.53Ga0.47As-GaAs; T-gate metamorphic high-electron mobility transistors; drain current; mHEMT; millimeter-wave frequency; noise figure; Gallium arsenide; HEMTs; MODFETs; Metallization; Millimeter wave technology; Millimeter wave transistors; Noise figure; Scanning electron microscopy; Substrates; mHEMTs; High-electron mobility transistor (HEMT); low noise; metamorphic; metamorphic high-electron mobility transistor (mHEMT); millimeter-wave imaging; nanometer gates; short gate;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2005.857716
Filename :
1522454
Link To Document :
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