DocumentCode
12017
Title
Evolution of Unified-RAM: 1T-DRAM and BE-SONOS Built on a Highly Scaled Vertical Channel
Author
Dong-Il Moon ; Jee-Yeon Kim ; Joon-Bae Moon ; Dong-Oh Kim ; Yang-Kyu Choi
Author_Institution
Dept. of Electr. Eng., Korea Adv. Inst. of Sci. & Technol., Daejeon, South Korea
Volume
61
Issue
1
fYear
2014
fDate
Jan. 2014
Firstpage
60
Lastpage
65
Abstract
4F2 multifunctional unified-RAM based on a highly scaled vertical channel is experimentally demonstrated. The high performance and reliable operation of bandgap-engineered nonvolatile memory as well as underlap 1T-DRAM with nonuniform channel doping for a long retention time and endurable operation is presented in a single transistor.
Keywords
DRAM chips; semiconductor doping; 4F2 multifunctional unified-RAM; BE-SONOS; bandgap-engineered nonvolatile memory; highly scaled vertical channel; nonuniform channel doping; retention time; single transistor; underlap 1T-DRAM; Computer architecture; Doping; Logic gates; Moon; Nonvolatile memory; Silicon; Tunneling; Bandgap engineering; SONOS; capacitorless 1T-DRAM; multifunction; nonvolatile memory; unified-RAM (URAM); vertical channel;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2013.2292316
Filename
6678770
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