• DocumentCode
    1202102
  • Title

    Contactless Measurement of Silicon Resistivity in Cylindrical TE01n Mode Cavities

  • Author

    Dmowski, Stanisiaw ; Krupka, Jerzy ; Milewski, Andrzej

  • Volume
    29
  • Issue
    1
  • fYear
    1980
  • fDate
    3/1/1980 12:00:00 AM
  • Firstpage
    67
  • Lastpage
    70
  • Abstract
    This paper presents a new contactless method of resistivity measurement of semiconductor plates which is being applied in the production practice with the use of microwave cylindrical TE01n nmode resonators The errors of resistivity measurement have been shown in the example of silicon plates and the TE013 mode cavity working in the X band. It has been shown that for the plates of thickness 100-1200 ¿m and diameters larger than 60 percent of the diameter of the cavity, silicon resistivity can be measured in the range of 10-6-102 ¿×m, accurate to several percent. Experimental verification of the present method has been made by comparison of the results of silicon resistivity measured by the conventional four-point probe method.
  • Keywords
    Conductivity measurement; Microwave measurements; Microwave theory and techniques; Probes; Production; Q factor; Resonance; Resonant frequency; Semiconductivity; Silicon;
  • fLanguage
    English
  • Journal_Title
    Instrumentation and Measurement, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9456
  • Type

    jour

  • DOI
    10.1109/TIM.1980.4314864
  • Filename
    4314864