• DocumentCode
    1204525
  • Title

    Magnetoresistive random access memory using magnetic tunnel junctions

  • Author

    Tehrani, Saied ; Slaughter, Jon M. ; DeHerrera, Mark ; Engel, Brad N. ; Rizzo, Nicholas D. ; Salter, John ; Durlam, Mark ; Dave, Renu W. ; Janesky, Jason ; Butcher, Brian ; Smith, Ken ; Grynkewich, Greg

  • Author_Institution
    Semicond. Products Sector, Motorola Inc., Tempe, AZ, USA
  • Volume
    91
  • Issue
    5
  • fYear
    2003
  • fDate
    5/1/2003 12:00:00 AM
  • Firstpage
    703
  • Lastpage
    714
  • Abstract
    Magnetoresistive random access memory (MRAM) technology combines a spintronic device with standard silicon-based microelectronics to obtain a combination of attributes not found in any other memory technology. Key attributes of MRAM technology are nonvolatility and unlimited read and write endurance. Magnetic tunnel junction (MTJ) devices have several advantages over other magnetoresistive devices for use in MRAM cells, such as a large signal for the read operation and a resistance that can be tailored to the circuit. Due to these attributes, MTJ MRAM can operate at high speed and is expected to have competitive densities when commercialized. In this paper, we review our recent progress in the development of MTJ-MRAM technology. We describe how the memory operates, including significant aspects of reading, writing, and integration of the magnetic material with CMOS, which enabled our recent demonstration of a 1-Mbit memory chip. Important memory attributes are compared between MRAM and other memory technologies.
  • Keywords
    magnetic storage; magnetic tunnelling; magnetoelectronics; magnetoresistive devices; random-access storage; 1 Mbit; CMOS technology; magnetic tunnel junction; magnetoresistive random access memory; nonvolatile memory; silicon microelectronics; spintronic device; CMOS technology; Commercialization; Magnetic circuits; Magnetic tunneling; Magnetoelectronics; Magnetoresistive devices; Microelectronics; Random access memory; Read-write memory; Tunneling magnetoresistance;
  • fLanguage
    English
  • Journal_Title
    Proceedings of the IEEE
  • Publisher
    ieee
  • ISSN
    0018-9219
  • Type

    jour

  • DOI
    10.1109/JPROC.2003.811804
  • Filename
    1200123