Title :
Power Performance at 40 GHz on Quaternary Barrier InAlGaN/GaN HEMT
Author :
Lecourt, Francois ; Agboton, Alain ; Ketteniss, N. ; Behmenburg, H. ; Defrance, Nicolas ; Hoel, Virginie ; Kalisch, Holger ; Vescan, Andrei ; Heuken, M. ; De Jaeger, J.-C.
Author_Institution :
Microwave Power Devices Group, Lille Univ., Villeneuve-d´Ascq, France
Abstract :
Depletion-mode high-electron mobility transistors (HEMTs) based on a quaternary barrier In0.11Al0.72Ga0.17N/GaN heterostructure on sapphire substrate are fabricated and characterized. This structure shows a very high Hall electron mobility of 2200 cm2/V·s, which is the highest value ever reported on In-containing GaN-based HEMTs. For T-shaped gate transistor with a gate length of 75 nm, current gain (ft) and power gain (fmax) cutoff frequencies of 113 and 200 GHz are extracted from S-parameter measurements, respectively. Nonlinear characterization of a T-shaped gate device with a gate length of 225 nm gives an output power density of 2 W/mm at 40 GHz. These results clearly demonstrate the capabilities of such quaternary barrier-based devices.
Keywords :
III-V semiconductors; S-parameters; aluminium compounds; electron mobility; gallium compounds; high electron mobility transistors; indium compounds; microwave transistors; sapphire; submillimetre wave transistors; wide band gap semiconductors; Al2O3; Hall electron mobility; In-containing GaN-based HEMT; InAlGaN-GaN; S-parameter measurements; T-shaped gate transistor; depletion-mode high-electron mobility transistors; frequency 40 GHz; quaternary barrier InAlGaN-GaN HEMT; quaternary barrier-based devices; sapphire substrate; Gallium alloys; microwave devices; power measurement; semiconductor device fabrication;
Journal_Title :
Electron Device Letters, IEEE
DOI :
10.1109/LED.2013.2266123