DocumentCode :
1206193
Title :
A Measurement System for the Determination of h/e2in Terms of the SI Ohm and the Maintained Ohm at the NPL
Author :
Hartland, A. ; Davies, G.J. ; Wood, D.R.
Issue :
2
fYear :
1985
fDate :
6/1/1985 12:00:00 AM
Firstpage :
309
Lastpage :
314
Abstract :
A measurement system comprising several stages has been developed to determine the value of the quantum Hall resistance, RH (= h/ie2), in silicon MOSFET and GaAs/Gai-xAlxAs heterostructure devices, at temperatures>0.3 K and in magnetic fields <14.5 T for the i = 2 and i = 4 plateaus. For this system, when operating under ideal conditions the expected overall one-standard deviation random uncertainties for a single measurement of RH in terms of ??SI and ??NPL, are 0.11 and 0.08 ppm, respectively. The results of several measurements on a silicon MOSFET and a GaAs/Ga1-xAlx As heterostructure device are presented leading to a mean value of h/e2 = 25812.8083(46)??SI.
Keywords :
Bridge circuits; Electrical resistance measurement; Gallium arsenide; Laboratories; MOSFET circuits; Magnetic field measurement; Measurement standards; Resistors; Silicon; Voltage;
fLanguage :
English
Journal_Title :
Instrumentation and Measurement, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9456
Type :
jour
DOI :
10.1109/TIM.1985.4315332
Filename :
4315332
Link To Document :
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