• DocumentCode
    1206289
  • Title

    An analytical and experimental investigation of the cutoff frequency fT of high-speed bipolar transistors

  • Author

    Nanba, Mitsuo ; Shiba, Takeo ; Nakamura, Tohru ; Toyabe, Toru

  • Author_Institution
    Hitachi, Ltd., Tokyo, Japan
  • Volume
    35
  • Issue
    7
  • fYear
    1988
  • fDate
    7/1/1988 12:00:00 AM
  • Firstpage
    1021
  • Lastpage
    1028
  • Abstract
    The effects of vertical and lateral structures on cutoff frequency and breakdown voltage are investigated for high-speed bipolar transistors. The cutoff frequencies are examined in the range from 2.5 to 80 GHz by analysis and from 3 to 20 GHz by experiment. To attain the maximum cutoff frequency, it is predicted that the collector width, the base width, and the collector concentration should be 0.12 μm, 0.07 μm, and 1.2×1016 cm-3, respectively, and that in this scaled transistor, breakdown voltages, BVCE0 and BVC8O should be reduced below 3 and 7.7 V respectively
  • Keywords
    bipolar integrated circuits; bipolar transistors; electric breakdown of solids; semiconductor device models; solid-state microwave devices; 0.07 micron; 0.12 micron; 2.5 to 80 GHz; 3 V; 7.7 V; EHF; SHF; base width; breakdown voltage; collector concentration; collector width; cutoff frequency; high-speed bipolar transistors; lateral structures; microwave operation; model; monolithic IC; scaled transistor; vertical structures; Bipolar transistors; Capacitance; Circuit synthesis; Cutoff frequency; Geometry; Integrated circuit technology; Lithography; Pareto analysis; Silicon; Substrates;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.3360
  • Filename
    3360