DocumentCode
1206289
Title
An analytical and experimental investigation of the cutoff frequency f T of high-speed bipolar transistors
Author
Nanba, Mitsuo ; Shiba, Takeo ; Nakamura, Tohru ; Toyabe, Toru
Author_Institution
Hitachi, Ltd., Tokyo, Japan
Volume
35
Issue
7
fYear
1988
fDate
7/1/1988 12:00:00 AM
Firstpage
1021
Lastpage
1028
Abstract
The effects of vertical and lateral structures on cutoff frequency and breakdown voltage are investigated for high-speed bipolar transistors. The cutoff frequencies are examined in the range from 2.5 to 80 GHz by analysis and from 3 to 20 GHz by experiment. To attain the maximum cutoff frequency, it is predicted that the collector width, the base width, and the collector concentration should be 0.12 μm, 0.07 μm, and 1.2×1016 cm-3, respectively, and that in this scaled transistor, breakdown voltages, BVCE0 and BVC8O should be reduced below 3 and 7.7 V respectively
Keywords
bipolar integrated circuits; bipolar transistors; electric breakdown of solids; semiconductor device models; solid-state microwave devices; 0.07 micron; 0.12 micron; 2.5 to 80 GHz; 3 V; 7.7 V; EHF; SHF; base width; breakdown voltage; collector concentration; collector width; cutoff frequency; high-speed bipolar transistors; lateral structures; microwave operation; model; monolithic IC; scaled transistor; vertical structures; Bipolar transistors; Capacitance; Circuit synthesis; Cutoff frequency; Geometry; Integrated circuit technology; Lithography; Pareto analysis; Silicon; Substrates;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.3360
Filename
3360
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