DocumentCode :
1208420
Title :
Growth and the microstructural and ferroelectric characterization of oriented BaMgF/sub 4/ thin films
Author :
Sinharoy, S. ; Buhay, H. ; Burke, M.G. ; Lampe, D.R. ; Pollak, T.M.
Author_Institution :
Westinghouse Sci. & Technol. Center, Pittsburgh, PA, USA
Volume :
38
Issue :
6
fYear :
1991
Firstpage :
663
Lastpage :
671
Abstract :
The growth of ferroelectric BaMgF/sub 4/ thin films on Si
Keywords :
barium compounds; crystal microstructure; dielectric hysteresis; dielectric polarisation; ferroelectric materials; ferroelectric storage; ferroelectric thin films; transmission electron microscope examination of materials; vacuum deposited coatings; 480 nm; Al/sub 2/O/sub 3/; MIS gate structure; Si; TEM; capacitance voltage measurements; coercivity; electrical contacts; ferroelectric characterization; ferroelectric hysteresis; ferroelectric memory field-effect transistor; growth; impurities; memory window; microstructural characterisation; oriented BaMgF/sub 4/ thin films; oriented crystalline films; polar axis orientation; programming voltage; sapphire substrate; spontaneous polarization; transmission electron microscopy; ultrahigh vacuum conditions; Coercive force; Crystal microstructure; Crystallization; Ferroelectric films; Ferroelectric materials; Hysteresis; Polarization; Substrates; Transistors; Transmission electron microscopy;
fLanguage :
English
Journal_Title :
Ultrasonics, Ferroelectrics, and Frequency Control, IEEE Transactions on
Publisher :
ieee
ISSN :
0885-3010
Type :
jour
DOI :
10.1109/58.108867
Filename :
108867
Link To Document :
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