DocumentCode
1210051
Title
Semiconductor Electron Detectors
Author
McKenzie, J.M. ; Ewan, G.T.
Author_Institution
Amperex Electronic Company, Hicksville, L. I., N. Y.
Volume
8
Issue
1
fYear
1961
Firstpage
50
Lastpage
53
Abstract
The properties of p-n junctions made by phosphorus diffusion in 12 000 ¿ cm p-type silicon have been examined using the Chalk River ¿ ¿2 à -ray spectrometer as a source of monoenergetic electrons. With 200 V reverse bias the depletion layer is thick enough to absorb totally 350 keV electrons. Up to 1200 keV some of the electrons are scattered sufficiently to deposit all their energy in the junction. This results in a total absorption peak up to electron energies of 1.2 MeV. However, at this energy most of the electrons act like minimum ionizing particles and deposit 180 keV of energy in the junction.
Keywords
Absorption; Electrons; P-n junctions; Particle scattering; Preamplifiers; Pulse amplifiers; Radiation detectors; Rivers; Silicon; Spectroscopy;
fLanguage
English
Journal_Title
Nuclear Science, IRE Transactions on
Publisher
ieee
ISSN
0096-2015
Type
jour
DOI
10.1109/TNS2.1961.4315798
Filename
4315798
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