DocumentCode :
1211636
Title :
Metal diffusion in polymers
Author :
Das, J.H. ; Morris, J.E.
Volume :
17
Issue :
4
fYear :
1994
fDate :
11/1/1994 12:00:00 AM
Firstpage :
620
Lastpage :
625
Abstract :
The diffusive properties of copper, nickel, titanium and chromium have been studied in three polyimides and a fluoropolymer using both sputter-deposited surface film and shallow ion-implant sources. No measurable diffusion was found for either chromium or titanium, but diffusion constants and their thermal activation energies are presented for copper and nickel in each polymer. All the copper and nickel systems exhibit the clustering effects previously reported, and both atomic and cluster diffusion data are cited where possible. The metallic diffusion profiles from the surface films typically display three components: an initial subsurface distribution (which is actually due to the penetration of the surface by low energy ions during sputter-deposition), a shallow cluster distribution which contains the bulk of the diffusing material, and a deeper dilute atomic distribution
Keywords :
chemical interdiffusion; chromium; copper; nickel; polymers; segregation; self-diffusion; surface diffusion; titanium; Cr; Cu; Ni; Ti; atomic diffusion data; cluster diffusion data; clustering effects; diffusion constants; diffusive properties; dilute atomic distribution; fluoropolymer; initial subsurface distribution; low energy ions; metallic diffusion profiles; polyimides; polymers; shallow cluster distribution; shallow ion-implant source; sputter-deposited surface film source; thermal activation energies; Atomic measurements; Chromium; Copper; Displays; Energy measurement; Inorganic materials; Nickel; Polyimides; Polymers; Titanium;
fLanguage :
English
Journal_Title :
Components, Packaging, and Manufacturing Technology, Part B: Advanced Packaging, IEEE Transactions on
Publisher :
ieee
ISSN :
1070-9894
Type :
jour
DOI :
10.1109/96.338732
Filename :
338732
Link To Document :
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