DocumentCode :
1212141
Title :
Analytical extraction method for submicron MOS transistor model parameters in the linear region
Author :
Karlsson, P R ; Jeppson, K.O.
Author_Institution :
Dept. of Solid State Electron., Chalmers Univ. of Technol., Goteborg, Sweden
Volume :
141
Issue :
6
fYear :
1994
fDate :
12/1/1994 12:00:00 AM
Firstpage :
457
Lastpage :
461
Abstract :
A novel four-point technique for direct extraction of model parameters of submicron transistors in the linear region is presented. Detailed analytical expressions are given for the extraction procedure. Theoretical sensitivity analysis shows that the influence of measurement noise can be reduced by proper choice of the applied voltages for which the data points are measured. As an example, a sensitivity of only 2% in the threshold voltage was obtained for 1% noise in the four data points. Experiments show that the extracted parameter values are constant within large intervals of applied voltages. Finally, as a generalisation of the direct extraction method, a least-square fitting technique is suggested which offers the user full freedom concerning the number of data points to be used
Keywords :
MOSFET; characteristics measurement; least squares approximations; semiconductor device models; sensitivity analysis; analytical extraction method; data point selection; drain current characteristics; four-point technique; least-square fitting technique; linear region; measurement noise; mobility reduction factor; sensitivity analysis; submicron MOS transistor model parameters; threshold voltage;
fLanguage :
English
Journal_Title :
Circuits, Devices and Systems, IEE Proceedings -
Publisher :
iet
ISSN :
1350-2409
Type :
jour
DOI :
10.1049/ip-cds:19941457
Filename :
338866
Link To Document :
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