Title :
Magnetic properties of Ni-Fe films prepared by a DC triode sputtering method
Author_Institution :
Sharp Corp., Nara, Japan
fDate :
5/1/1988 12:00:00 AM
Abstract :
The magnetic properties of Ni-Fe films with 81-wt.% Ni prepared by a DC triode sputtering method are studied as functions of sputtering parameters. Two kinds of substrates are used: one is flat and the other is patterned. In the former case sufficiently low coercive forces are obtained when both the target voltage and the Ar pressure are kept below the critical values. In the latter case, a negative substrate bias voltage is necessary to improve the magnetic properties in addition to the previous conditions.
Keywords :
coercive force; ferromagnetic properties of substances; iron alloys; magnetic thin films; nickel alloys; sputtered coatings; Ar pressure; DC triode sputtering; Ni-Fe films; coercive forces; ferromagnet; magnetic properties; negative substrate bias voltage; target voltage; Argon; Glass; Magnetic anisotropy; Magnetic field measurement; Magnetic films; Magnetic properties; Sputter etching; Sputtering; Substrates; Voltage;
Journal_Title :
Magnetics, IEEE Transactions on
