DocumentCode
1212859
Title
Quantum resistance standards with double 2DEG
Author
Bounouh, Alexandre ; Poirier, W. ; Piquemal, F. ; Genevès, Gérard ; André, J.P.
Author_Institution
Lab. Nat. d´´Essai, Bur. Nat. de Metrologie, Fontenay-aux-Roses, France
Volume
52
Issue
2
fYear
2003
fDate
4/1/2003 12:00:00 AM
Firstpage
555
Lastpage
558
Abstract
We have developed a new generation of quantum Hall array resistance standards (QHARS) obtained from GaAs/AlGaAs heterostructures with double two-dimensional electron gases (2DEGs) grown by the metal-organic vapor phase epitaxy process. We have achieved the fabrication of such a multilayer system with well matched carrier density and mobility of the two 2DEGs and characteristics required for metrological use. This technological achievement allowed calibrations in terms of a quantized Hall resistance (RK/2 on i=2 plateau) of a single Hall bar (RK/4) and 50 Hall bars placed in parallel by triple connections QHARS129 (RK/200). In both cases relative deviations of their Hall resistance from their expected nominal value are found lower than eight parts in 109, corresponding to the measurement uncertainty (1σ). These measurements were performed on QHARS129 samples supplied by higher measuring currents up to 2 mA at 1.3 K.
Keywords
III-V semiconductors; MOCVD; aluminium compounds; calibration; carrier density; carrier mobility; electric resistance; gallium arsenide; low-temperature techniques; measurement standards; measurement uncertainty; quantum Hall effect; semiconductor growth; semiconductor heterojunctions; two-dimensional electron gas; vapour phase epitaxial growth; 1.3 K; 2 mA; GaAs-AlGaAs; GaAs/AlGaAs heterostructures; Hall resistance relative deviations; QHARS; QHARS129 triple connections; calibration; carrier density; carrier mobility; cryogenic current comparator bridge; double 2D electron gases; double 2DEG; measurement uncertainty; measuring currents; metal-organic vapor phase epitaxy process; multilayer system fabrication; parallel Hall bars; quantized Hall resistance; quantum Hall array resistance standards; quantum resistance standards; semiconductor microstructures; single Hall bar; Current measurement; Electrical resistance measurement; Electrons; Epitaxial growth; Fabrication; Gallium arsenide; Gases; Nonhomogeneous media; Phased arrays; Standards development;
fLanguage
English
Journal_Title
Instrumentation and Measurement, IEEE Transactions on
Publisher
ieee
ISSN
0018-9456
Type
jour
DOI
10.1109/TIM.2003.811655
Filename
1202096
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