• DocumentCode
    1212859
  • Title

    Quantum resistance standards with double 2DEG

  • Author

    Bounouh, Alexandre ; Poirier, W. ; Piquemal, F. ; Genevès, Gérard ; André, J.P.

  • Author_Institution
    Lab. Nat. d´´Essai, Bur. Nat. de Metrologie, Fontenay-aux-Roses, France
  • Volume
    52
  • Issue
    2
  • fYear
    2003
  • fDate
    4/1/2003 12:00:00 AM
  • Firstpage
    555
  • Lastpage
    558
  • Abstract
    We have developed a new generation of quantum Hall array resistance standards (QHARS) obtained from GaAs/AlGaAs heterostructures with double two-dimensional electron gases (2DEGs) grown by the metal-organic vapor phase epitaxy process. We have achieved the fabrication of such a multilayer system with well matched carrier density and mobility of the two 2DEGs and characteristics required for metrological use. This technological achievement allowed calibrations in terms of a quantized Hall resistance (RK/2 on i=2 plateau) of a single Hall bar (RK/4) and 50 Hall bars placed in parallel by triple connections QHARS129 (RK/200). In both cases relative deviations of their Hall resistance from their expected nominal value are found lower than eight parts in 109, corresponding to the measurement uncertainty (1σ). These measurements were performed on QHARS129 samples supplied by higher measuring currents up to 2 mA at 1.3 K.
  • Keywords
    III-V semiconductors; MOCVD; aluminium compounds; calibration; carrier density; carrier mobility; electric resistance; gallium arsenide; low-temperature techniques; measurement standards; measurement uncertainty; quantum Hall effect; semiconductor growth; semiconductor heterojunctions; two-dimensional electron gas; vapour phase epitaxial growth; 1.3 K; 2 mA; GaAs-AlGaAs; GaAs/AlGaAs heterostructures; Hall resistance relative deviations; QHARS; QHARS129 triple connections; calibration; carrier density; carrier mobility; cryogenic current comparator bridge; double 2D electron gases; double 2DEG; measurement uncertainty; measuring currents; metal-organic vapor phase epitaxy process; multilayer system fabrication; parallel Hall bars; quantized Hall resistance; quantum Hall array resistance standards; quantum resistance standards; semiconductor microstructures; single Hall bar; Current measurement; Electrical resistance measurement; Electrons; Epitaxial growth; Fabrication; Gallium arsenide; Gases; Nonhomogeneous media; Phased arrays; Standards development;
  • fLanguage
    English
  • Journal_Title
    Instrumentation and Measurement, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9456
  • Type

    jour

  • DOI
    10.1109/TIM.2003.811655
  • Filename
    1202096