Title :
Polarization-dependent Talbot effect with variable duty cycle
Author :
Shubin Li ; Changhe Zhou ; Barbastathis, George
Author_Institution :
Shanghai Inst. of Opt. & Fine Mech., Shanghai, China
Abstract :
It has recently been observed that the location of Talbot planes becomes dependent on polarization of the incident light for grating periods in the rage of 2~3 free-space wavelengths. Here, we investigate the effect of grating duty cycle and its potential use for control of two- or three-dimensional pattern formation in nanolithography.
Keywords :
Talbot effect; diffraction gratings; light polarisation; nanolithography; nanophotonics; Talbot planes; nanolithography; pattern formation; polarization-dependent Talbot effect; variable duty cycle; Delays; Diffraction; Gratings; Indexes; Optical polarization; Optimized production technology; Talbot effect;
Conference_Titel :
Optical MEMS and Nanophotonics (OMN), 2014 International Conference on
Conference_Location :
Glasgow
Print_ISBN :
978-0-9928-4140-9
DOI :
10.1109/OMN.2014.6924584
