DocumentCode
1213445
Title
Noise in Silicon Nanowires
Author
Reza, Shahed ; Bosman, Gijs ; Islam, M. Saif ; Kamins, Theodore I. ; Sharma, Shashank ; Williams, R.Stanley
Author_Institution
Florida Univ., Gainesville, FL
Volume
5
Issue
5
fYear
2006
Firstpage
523
Lastpage
529
Abstract
The current-voltage and noise characteristics of bridging silicon wires have been measured at room temperature. From the linear current-voltage characteristics the bulk and contact resistance contributions are extracted and modeled. The excess noise observed at low frequencies is interpreted in terms of bulk and contact noise contributions, with the former comparable, in terms of Hooge parameter values, to the low noise levels observed in high-quality silicon devices. The contact noise is significant in some devices and is attributed to the impinging end of the bridging nanowires
Keywords
1/f noise; contact resistance; elemental semiconductors; nanoelectronics; nanowires; semiconductor device models; semiconductor device noise; silicon; 1/f noise; 293 to 298 K; Hooge parameter values; Si; contact noise; contact resistance; current-voltage characteristics; noise characteristics; room temperature; silicon nanowires; Current measurement; Current-voltage characteristics; Electrical resistance measurement; Low-frequency noise; Nanowires; Noise level; Noise measurement; Silicon; Temperature measurement; Wires; Carbon nanotube; contact noise; nanowire; noise;
fLanguage
English
Journal_Title
Nanotechnology, IEEE Transactions on
Publisher
ieee
ISSN
1536-125X
Type
jour
DOI
10.1109/TNANO.2006.880908
Filename
1695951
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