• DocumentCode
    1213445
  • Title

    Noise in Silicon Nanowires

  • Author

    Reza, Shahed ; Bosman, Gijs ; Islam, M. Saif ; Kamins, Theodore I. ; Sharma, Shashank ; Williams, R.Stanley

  • Author_Institution
    Florida Univ., Gainesville, FL
  • Volume
    5
  • Issue
    5
  • fYear
    2006
  • Firstpage
    523
  • Lastpage
    529
  • Abstract
    The current-voltage and noise characteristics of bridging silicon wires have been measured at room temperature. From the linear current-voltage characteristics the bulk and contact resistance contributions are extracted and modeled. The excess noise observed at low frequencies is interpreted in terms of bulk and contact noise contributions, with the former comparable, in terms of Hooge parameter values, to the low noise levels observed in high-quality silicon devices. The contact noise is significant in some devices and is attributed to the impinging end of the bridging nanowires
  • Keywords
    1/f noise; contact resistance; elemental semiconductors; nanoelectronics; nanowires; semiconductor device models; semiconductor device noise; silicon; 1/f noise; 293 to 298 K; Hooge parameter values; Si; contact noise; contact resistance; current-voltage characteristics; noise characteristics; room temperature; silicon nanowires; Current measurement; Current-voltage characteristics; Electrical resistance measurement; Low-frequency noise; Nanowires; Noise level; Noise measurement; Silicon; Temperature measurement; Wires; Carbon nanotube; contact noise; nanowire; noise;
  • fLanguage
    English
  • Journal_Title
    Nanotechnology, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    1536-125X
  • Type

    jour

  • DOI
    10.1109/TNANO.2006.880908
  • Filename
    1695951